Inventor
ABE NAOMICHI
JP7 patents
Patents
7 patentsUS5961775AOct 5, 1999
Apparatus for removing organic resist from semiconductor
FUJITSU LTD483 citations98
US4384918AMay 24, 1983
Method and apparatus for dry etching and electrostatic chucking device used therein
FUJITSU LTD547 citations97
US5773201AJun 30, 1998
Method of stripping a resist mask
FUJITSU LTD49 citations95
US5017461AMay 21, 1991
Formation of a negative resist pattern utilize water-soluble polymeric material and photoacid generator
FUJITSU LTD75 citations94
US5194364AMar 16, 1993
Process for formation of resist patterns
FUJITSU LTD20 citations81
US5998104ADec 7, 1999
Method of stripping a resist mask
FUJITSU LTD4 citations62
US5030316AJul 9, 1991
Trench etching process
FUJITSU LTD6 citations61