Inventor
VAN HERPEN MAARTEN MARINUS JOH
NL24 patents
⚠️ This page may combine multiple inventors who share the name “VAN HERPEN MAARTEN MARINUS JOH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
23 patentsUS7462850B2Dec 9, 2008
Radical cleaning arrangement for a lithographic apparatus
ASML NETHERLANDS BV60 citations98
US7453645B2Nov 18, 2008
Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV23 citations92
US7414700B2Aug 19, 2008
Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
ASML NETHERLANDS BV16 citations92
US7372049B2May 13, 2008
Lithographic apparatus including a cleaning device and method for cleaning an optical element
ASML NETHERLANDS BV21 citations92
US7355672B2Apr 8, 2008
Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
ASML NETHERLANDS BV16 citations92
US7145132B2Dec 5, 2006
Lithographic apparatus, illumination system and debris trapping system
ASML NETHERLANDS BV30 citations92
US7106832B2Sep 12, 2006
Apparatus including a radiation source, a filter system for filtering particles out of radiation emitted by the source, and a processing system for processing the radiation, a lithographic apparatus including such an apparatus, and a method of filtering particles out of radiation emitting and propagating from a radiation source
ASML NETHERLANDS BV33 citations92
US7473908B2Jan 6, 2009
Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface
ASML NETHERLANDS BV22 citations89
US7598503B2Oct 6, 2009
Lithographic apparatus and cleaning method therefor
ASML NETHERLANDS BV11 citations84
US7518128B2Apr 14, 2009
Lithographic apparatus comprising a cleaning arrangement, cleaning arrangement and method for cleaning a surface to be cleaned
ASML NETHERLANDS BV10 citations84
US7336416B2Feb 26, 2008
Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
ASML NETHERLANDS BV12 citations84
US7332731B2Feb 19, 2008
Radiation system and lithographic apparatus
ASML NETHERLANDS BV15 citations84
US7504643B2Mar 17, 2009
Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement
ASML NETHERLANDS BV10 citations83
US7233010B2Jun 19, 2007
Radiation system and lithographic apparatus
ASML NETHERLANDS BV12 citations80
US7463413B2Dec 9, 2008
Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
ASML NETHERLANDS BV8 citations74
US7262423B2Aug 28, 2007
Radiation system and lithographic apparatus
ASML NETHERLANDS BV8 citations74
US7196343B2Mar 27, 2007
Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV9 citations74
US7145631B2Dec 5, 2006
Lithographic apparatus, illumination system and method for mitigating debris particles
ASML NETHERLANDS BV4 citations63
US7468521B2Dec 23, 2008
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV6 citations61
US7397538B2Jul 8, 2008
Radiation system and lithographic apparatus
ASML NETHERLANDS BV3 citations61
US7629594B2Dec 8, 2009
Lithographic apparatus, and device manufacturing method
ASML NETHERLANDS BV2 citations59
US7615767B2Nov 10, 2009
Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
ASML NETHERLANDS BV0 citations52
US7629593B2Dec 8, 2009
Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method
ASML NETHERLANDS BV0 citations41