Inventor
LOSERT EWALD
CH12 patents
⚠️ This page may combine multiple inventors who share the name “LOSERT EWALD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CIBA GEIGY CORP
11 patentsUS4632900ADec 30, 1986
Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface
CIBA GEIGY CORP56 citations96
US4413052ANov 1, 1983
Photopolymerization process employing compounds containing acryloyl group and anthryl group
CIBA GEIGY CORP66 citations94
US4416975ANov 22, 1983
Photopolymerization process employing compounds containing acryloyl groups and maleimide groups
CIBA GEIGY CORP42 citations91
US4230793AOct 28, 1980
Process for the production of solder masks for printed circuits
CIBA GEIGY CORP43 citations91
US4440850AApr 3, 1984
Photopolymerisation process with two exposures of a single layer
CIBA GEIGY CORP29 citations89
US4544623AOct 1, 1985
Photosensitive coating composition and the use thereof for protective purposes
CIBA GEIGY CORP51 citations88
US3956043AMay 11, 1976
Process for the manufacture of printed multi-layer circuits
CIBA GEIGY CORP24 citations78
US5124233AJun 23, 1992
Photoresist compositions
CIBA GEIGY CORP15 citations73
US3996121ADec 7, 1976
Radiation polymerizable esters
CIBA GEIGY CORP9 citations73
US4502957AMar 5, 1985
Process for purifying organic solutions
CIBA GEIGY CORP17 citations68
US4161588AJul 17, 1979
Polymerizable esters
CIBA GEIGY CORP6 citations62