Inventor
LAIDIG THOMAS
US44 patents
⚠️ This page may combine multiple inventors who share the name “LAIDIG THOMAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML MASKTOOLS BV
22 patentsUS7175940B2Feb 13, 2007
Method of two dimensional feature model calibration and optimization
ASML MASKTOOLS BV365 citations98
US6670081B2Dec 30, 2003
Optical proximity correction method utilizing serifs having variable dimensions
ASML MASKTOOLS BV61 citations96
US7247574B2Jul 24, 2007
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
ASML MASKTOOLS BV47 citations95
US6851103B2Feb 1, 2005
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
ASML MASKTOOLS BV44 citations95
US7550235B2Jun 23, 2009
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
ASML MASKTOOLS BV25 citations92
US7231629B2Jun 12, 2007
Feature optimization using enhanced interference mapping lithography
ASML MASKTOOLS BV27 citations92
US6951701B2Oct 4, 2005
Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM
ASML MASKTOOLS BV18 citations92
US6623895B2Sep 23, 2003
Hybrid phase-shift mask
ASML MASKTOOLS BV38 citations92
US7523438B2Apr 21, 2009
Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM
ASML MASKTOOLS BV15 citations84
US7434195B2Oct 7, 2008
Method for performing full-chip manufacturing reliability checking and correction
ASML MASKTOOLS BV13 citations84
US7355681B2Apr 8, 2008
Optical proximity correction using chamfers and rounding at corners
ASML MASKTOOLS BV10 citations84
US7354681B2Apr 8, 2008
Scattering bar OPC application method for sub-half wavelength lithography patterning
ASML MASKTOOLS BV11 citations84
US7820341B2Oct 26, 2010
Method of two dimensional feature model calibration and optimization
ASML MASKTOOLS BV12 citations83
US7774736B2Aug 10, 2010
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
ASML MASKTOOLS BV8 citations83
US7349066B2Mar 25, 2008
Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence
ASML MASKTOOLS BV9 citations83
US7892707B2Feb 22, 2011
Scattering bar OPC application method for sub-half wavelength lithography patterning
ASML MASKTOOLS BV4 citations74
US7485396B2Feb 3, 2009
Scattering bar OPC application method for sub-half wavelength lithography patterning
ASML MASKTOOLS BV4 citations74
US7549140B2Jun 16, 2009
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
ASML MASKTOOLS BV5 citations73
US6835510B2Dec 28, 2004
Hybrid phase-shift mask
ASML MASKTOOLS BV11 citations73
US8039180B2Oct 18, 2011
Scattering bar OPC application method for sub-half wavelength lithography patterning
ASML MASKTOOLS BV1 citations63
US7892703B2Feb 22, 2011
CPL mask and a method and program product for generating the same
ASML MASKTOOLS BV1 citations52
US7856606B2Dec 21, 2010
Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
ASML MASKTOOLS BV1 citations47
APPLIED MATERIALS INC
9 patentsUS9250509B2Feb 2, 2016
Optical projection array exposure system
APPLIED MATERIALS INC6 citations83
US9519226B2Dec 13, 2016
Optical imaging writer system
APPLIED MATERIALS INC4 citations73
US9733573B2Aug 15, 2017
Optical projection array exposure system
APPLIED MATERIALS INC2 citations72
US10031427B2Jul 24, 2018
Methods and apparatus for vibration damping stage
APPLIED MATERIALS INC3 citations71
US10036966B2Jul 31, 2018
Environmental control of systems for photolithography process
APPLIED MATERIALS INC1 citations52
US9405203B2Aug 2, 2016
Pixel blending for multiple charged-particle beam lithography
APPLIED MATERIALS INC1 citations52
US10409172B2Sep 10, 2019
Digital photolithography using compact eye module layout
APPLIED MATERIALS INC0 citations51
US10037589B2Jul 31, 2018
Parallel image processing system
APPLIED MATERIALS INC0 citations48
US9907152B2Feb 27, 2018
Illumination system with monitoring optical output power
APPLIED MATERIALS INC0 citations41
CHEN JANG FUNG
6 patentsUS9507271B1Nov 29, 2016
System and method for manufacturing multiple light emitting diodes in parallel
CHEN JANG FUNG7 citations84
US9025136B2May 5, 2015
System and method for manufacturing three dimensional integrated circuits
CHEN JANG FUNG15 citations84
US8670106B2Mar 11, 2014
Optical imaging writer system
CHEN JANG FUNG12 citations84
US8253923B1Aug 28, 2012
Optical imaging writer system
CHEN JANG FUNG11 citations84
US8132130B2Mar 6, 2012
Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process
CHEN JANG FUNG15 citations84
US9158190B2Oct 13, 2015
Optical imaging writer system
CHEN JANG FUNG3 citations62