Inventor
WAMPLER KURT E
US26 patents
⚠️ This page may combine multiple inventors who share the name “WAMPLER KURT E”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML MASKTOOLS BV
23 patentsUS7175940B2Feb 13, 2007
Method of two dimensional feature model calibration and optimization
ASML MASKTOOLS BV365 citations98
US6114071ASep 5, 2000
Method of fine feature edge tuning with optically-halftoned mask
ASML MASKTOOLS BV285 citations97
US6670081B2Dec 30, 2003
Optical proximity correction method utilizing serifs having variable dimensions
ASML MASKTOOLS BV61 citations96
US7247574B2Jul 24, 2007
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
ASML MASKTOOLS BV47 citations95
US7138212B2Nov 21, 2006
Method and apparatus for performing model-based layout conversion for use with dipole illumination
ASML MASKTOOLS BV39 citations95
US6851103B2Feb 1, 2005
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
ASML MASKTOOLS BV44 citations95
US6312854B1Nov 6, 2001
Method of patterning sub-0.25 lambda line features with high transmission, “attenuated” phase shift masks
ASML MASKTOOLS BV44 citations94
US7550235B2Jun 23, 2009
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
ASML MASKTOOLS BV25 citations92
US6623895B2Sep 23, 2003
Hybrid phase-shift mask
ASML MASKTOOLS BV38 citations92
US6482555B2Nov 19, 2002
Method of patterning sub-0.25λ line features with high transmission, “attenuated” phase shift masks
ASML MASKTOOLS BV21 citations91
US7434195B2Oct 7, 2008
Method for performing full-chip manufacturing reliability checking and correction
ASML MASKTOOLS BV13 citations84
US7376930B2May 20, 2008
Method, program product and apparatus for generating assist features utilizing an image field map
ASML MASKTOOLS BV13 citations84
US7354681B2Apr 8, 2008
Scattering bar OPC application method for sub-half wavelength lithography patterning
ASML MASKTOOLS BV11 citations84
US7820341B2Oct 26, 2010
Method of two dimensional feature model calibration and optimization
ASML MASKTOOLS BV12 citations83
US7774736B2Aug 10, 2010
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
ASML MASKTOOLS BV8 citations83
US7666554B2Feb 23, 2010
Method and apparatus for performing model-based layout conversion for use with dipole illumination
ASML MASKTOOLS BV11 citations83
US7892707B2Feb 22, 2011
Scattering bar OPC application method for sub-half wavelength lithography patterning
ASML MASKTOOLS BV4 citations74
US7485396B2Feb 3, 2009
Scattering bar OPC application method for sub-half wavelength lithography patterning
ASML MASKTOOLS BV4 citations74
US7549140B2Jun 16, 2009
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
ASML MASKTOOLS BV5 citations73
US6835510B2Dec 28, 2004
Hybrid phase-shift mask
ASML MASKTOOLS BV11 citations73
US8039180B2Oct 18, 2011
Scattering bar OPC application method for sub-half wavelength lithography patterning
ASML MASKTOOLS BV1 citations63
US7985515B2Jul 26, 2011
Method and apparatus for performing model-based layout conversion for use with dipole illumination
ASML MASKTOOLS BV0 citations51
US7998355B2Aug 16, 2011
CPL mask and a method and program product for generating the same
ASML MASKTOOLS BV0 citations42