Inventor

MOCHIKI HIROMASA

JP10 patents

⚠️ This page may combine multiple inventors who share the name “MOCHIKI HIROMASA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

5 patents

US8383001B2Feb 26, 2013

Plasma etching method, plasma etching apparatus and storage medium

TOKYO ELECTRON LTD60 citations97

US9496150B2Nov 15, 2016

Etching processing method

TOKYO ELECTRON LTD40 citations93

US7829469B2Nov 9, 2010

Method and system for uniformity control in ballistic electron beam enhanced plasma processing system

TOKYO ELECTRON LTD13 citations83

US7723236B2May 25, 2010

Gas setting method, gas setting apparatus, etching apparatus and substrate processing system

TOKYO ELECTRON LTD1 citations51

US7709397B2May 4, 2010

Method and system for etching a high-k dielectric material

TOKYO ELECTRON LTD1 citations50

YATSUDA KOICHI

2 patents

US8641916B2Feb 4, 2014

Plasma etching apparatus, plasma etching method and storage medium

YATSUDA KOICHI67 citations96

US8685267B2Apr 1, 2014

Substrate processing method

YATSUDA KOICHI43 citations92

MOCHIKI HIROMASA

1 patent

US9373521B2Jun 21, 2016

Etching processing method

MOCHIKI HIROMASA35 citations90

IBM

1 patent

US7172969B2Feb 6, 2007

Method and system for etching a film stack

IBM13 citations80

KOSHIMIZU CHISHIO

1 patent

US9136097B2Sep 15, 2015

Shower plate and substrate processing apparatus

KOSHIMIZU CHISHIO1 citations51