P

Inventor

ANTONI MARTIN

DE31 patents
⚠️ This page may combine multiple inventors who share the name “ANTONI MARTIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ZEISS CARL SMT AG

22 patents
US7186983B2Mar 6, 2007

Illumination system particularly for microlithography

ZEISS CARL SMT AG21 citations93
US7583433B2Sep 1, 2009

Multi mirror system for an illumination system

ZEISS CARL SMT AG13 citations92
US7321126B2Jan 22, 2008

Collector with fastening devices for fastening mirror shells

ZEISS CARL SMT AG26 citations92
US6840640B2Jan 11, 2005

Multi mirror system for an illumination system

ZEISS CARL SMT AG18 citations92
US7473907B2Jan 6, 2009

Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination

ZEISS CARL SMT AG26 citations90
US7348565B2Mar 25, 2008

Illumination system particularly for microlithography

ZEISS CARL SMT AG10 citations84
US6947124B2Sep 20, 2005

Illumination system particularly for microlithography

ZEISS CARL SMT AG13 citations84
US6655808B2Dec 2, 2003

Focusing-device for the radiation from a light source

ZEISS CARL SMT AG13 citations84
US7329886B2Feb 12, 2008

EUV illumination system having a plurality of light sources for illuminating an optical element

ZEISS CARL SMT AG18 citations83
US7456408B2Nov 25, 2008

Illumination system particularly for microlithography

ZEISS CARL SMT AG6 citations74
US7142285B2Nov 28, 2006

Illumination system particularly for microlithography

ZEISS CARL SMT AG9 citations74
US7109497B2Sep 19, 2006

Illumination system particularly for microlithography

ZEISS CARL SMT AG8 citations74
US6858853B2Feb 22, 2005

Illumination system particularly for microlithography

ZEISS CARL SMT AG11 citations74
US7410265B2Aug 12, 2008

Focusing-device for the radiation from a light source

ZEISS CARL SMT AG7 citations73
US7091505B2Aug 15, 2006

Collector with fastening devices for fastening mirror shells

ZEISS CARL SMT AG8 citations73
US7592598B2Sep 22, 2009

Illumination system particularly for microlithography

ZEISS CARL SMT AG2 citations63
US7400699B2Jul 15, 2008

Illumination system with raster elements of different sizes

ZEISS CARL SMT AG2 citations63
US6947120B2Sep 20, 2005

Illumination system particularly for microlithography

ZEISS CARL SMT AG3 citations63
US7443948B2Oct 28, 2008

Illumination system particularly for microlithography

ZEISS CARL SMT AG2 citations62
US7871171B2Jan 18, 2011

Focusing-device for the radiation from a light source

ZEISS CARL SMT AG0 citations52
USRE41667ESep 14, 2010

Illumination system particularly for microlithography

ZEISS CARL SMT AG1 citations52
USRE42065EJan 25, 2011

Illumination system particularly for microlithography

ZEISS CARL SMT AG0 citations42

ZEISS STIFTUNG

3 patents

ZEISS CARL SMT GMBH

2 patents

ZEISS CARL SEMICONDUCTOR MFG

2 patents

CARL ZEISS SEMICONDUCTOR

1 patent

ASML LITHOGRAPHY B V

1 patent