Inventor

SINGER WOLFGANG

DE123 patents

⚠️ This page may combine multiple inventors who share the name “SINGER WOLFGANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SINGER WOLFGANG

ZEISS CARL SMT AG

Illumination system with variable adjustment of the illumination

Optical beam transformation system and illumination system comprising an optical beam transformation system

Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm

Objectives as a microlithography projection objective with at least one liquid lens

Optical system for ultraviolet light

Illumination system particularly for microlithography

Collector for an illumination system with a wavelength of less than or equal to 193 nm

Illumination system for a microlithography projection exposure installation

Multi mirror system for an illumination system

Collector configured of mirror shells

Collector with fastening devices for fastening mirror shells

Collector having unused region for illumination systems using a wavelength ≦193 nm

Lighting system, particularly for use in extreme ultraviolet (EUV) lithography

Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system

Multi mirror system for an illumination system

Projection exposure system

Optical device with raster elements, and illumination system with the optical device

Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination

Projection objective and projection exposure apparatus with negative back focus of the entry pupil

Objectives as a microlithography projection objective with at least one liquid lens

Illumination system particularly for microlithography

Illumination system with a grating element

Illumination system particularly for microlithography

Focusing-device for the radiation from a light source

Projection lens system of a microlithographic projection exposure installation

Illumination system with zoom objective

EUV illumination system having a plurality of light sources for illuminating an optical element

Method and apparatus for analysis of schlieren

Illumination system with a plurality of individual gratings

Facet mirror having a number of mirror facets

ZEISS CARL SMT GMBH

Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system

Illumination system particularly for microlithography

Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror

ZEISS CARL AG

Optical system and method for transmitting a source image

Optical system and method for transmitting a source image

ZEISS CARL SEMICONDUCTOR MFG

Projection objective having adjacently mounted aspheric lens surfaces

Illumination system particularly for microlithography

SHAFER DAVID

Catadioptric projection objective

Catadioptric projection objective

ZEISS STIFTUNG

Illumination system particularly for microlithography

IBM

Bluetooth theft control

AVL LIST GMBH

Method and apparatus for determining the non-volatile component of aerosol particles in a gas sample

CARL ZEISS SEMICONDUCTOR

Illumination system particularly for microlithography

BEDER SUSANNE

Projection objective having a high aperture and a planar end surface

ZEISS CARL MICROSCOPY GMBH

Arrangement for light sheet microscopy

DEGUENTHER MARKUS

Microlithographic illumination system

ASML NETHERLANDS BV

Lithographic apparatus and device manufacturing method

PAZIDIS ALEXANDRA

Projection system with compensation of intensity variations and compensation element therefor

CARL ZEISS SHIFTUNG

Projection lens, in particular for microlithography

MANN HANS-JUERGEN

Projection objective and projection exposure apparatus with negative back focus of the entry pupil