Inventor

KUGLER JENS

DE63 patents

⚠️ This page may combine multiple inventors who share the name “KUGLER JENS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KUGLER JENS

ZEISS CARL SMT GMBH

Positioning unit and alignment device for an optical element

Positioning unit and apparatus for adjustment of an optical element

Positioning unit and apparatus for adjustment of an optical element

Positioning unit and alignment device for an optical element

Optical module for a microlithography objective holding optical elements with supporting devices located in a non-equidistant manner

Optical module with a measuring device

Optical imaging arrangement with a piezoelectric device

Positioning unit and apparatus for adjustment of an optical element

Optical element module with minimized parasitic loads

Optical projection system

Exposure apparatus and measuring device for a projection lens

Optical projection system

Replacement apparatus for an optical element

Optical imaging device and method for reducing dynamic fluctuations in pressure difference

Replacement apparatus for an optical element

Optical imaging device with thermal attenuation

Optical imaging device with thermal attenuation

System and projection exposure apparatus

Projection exposure apparatus for semiconductor lithography

Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithography

Damping arrangement for vibration damping of an element in an optical system

Optical imaging arrangement with actively adjustable metrology support units

Positioning unit and apparatus for adjustment of an optical element

Optical module for a microlithography objective holding optical elements with supporting device located in non-equidistant manner

Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations

Optical element module with minimized parasitic loads

Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus

Microlithographic projection exposure apparatus and measuring device for a projection lens

Optical projection system

Replacement apparatus for an optical element

ZEISS CARL SMT AG

Positioning unit and alignment device for an optical element

Replacement apparatus for an optical element

Projection lens and microlithographic projection exposure apparatus

Lens system, in particular a projection lens system for semiconductor lithography

Reflecting optical element with eccentric optical passageway

Support device for positioning an optical element

Replacement apparatus for an optical element

Method of manufacturing an optical component

Optical element module

Replacement apparatus for an optical element

Projection lens and microlithographic projection exposure apparatus

KUGLER JENS

Optical module for a microlithography objective including holding and supporting devices

Replacement apparatus for an optical element

Support elements for an optical element

WEBER ULRICH

Positioning unit and alignment device for an optical element

SCHAFFER DIRK

Optical arrangement in a microlithographic projection exposure apparatus

EHM DIRK HEINRICH

Protection module for EUV lithography apparatus, and EUV lithography apparatus

RAU JOHANNES

Optical projection system

EHRMANN ALBRECHT

Exposure apparatus and measuring device for a projection lens

ZEISS CARL SEMICONDUCTOR MFG

Mount for an optical element in an optical imaging device