Inventor
SCHADT III FRANK L
US18 patents
Patents
18 patentsUS6849377B2Feb 1, 2005
Photoresists, polymers and processes for microlithography
DU PONT84 citations97
US4225665ASep 30, 1980
Photographic element in which the antistatic layer is interlinked in the base
DU PONT81 citations95
US6503686B1Jan 7, 2003
Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography
DU PONT53 citations92
US5886101AMar 23, 1999
Solvent dispersible interpenetrating polymer networks
DU PONT22 citations92
US4668748AMay 26, 1987
Crosslinkable antistatic polymers and their manufacture
DU PONT36 citations89
US6899995B2May 31, 2005
Protecting groups in polymers, photoresists and processes for microlithography
DU PONT12 citations84
US6884564B2Apr 26, 2005
Fluorinated polymers having ester groups and photoresists for microlithography
DU PONT13 citations83
US7108953B2Sep 19, 2006
Dissolution inhibitors in photoresist compositions for microlithography
DU PONT7 citations73
US4810624AMar 7, 1989
Photographic element with antistatic polymers
DU PONT9 citations70
US7264914B2Sep 4, 2007
Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography
DU PONT2 citations62
US7166416B2Jan 23, 2007
Protecting groups in polymers, photoresists and processes for microlithography
DU PONT2 citations62
US4460679AJul 17, 1984
Low coating weight silver halide element
DU PONT5 citations62
US7205086B2Apr 17, 2007
Multilayer elements containing photoresist compositions and their use in microlithography
DU PONT3 citations60
US7045268B2May 16, 2006
Polymers blends and their use in photoresist compositions for microlithography
DU PONT2 citations60
US7312287B2Dec 25, 2007
Fluorinated polymers useful as photoresists, and processes for microlithography
DU PONT0 citations52
US7019092B2Mar 28, 2006
Fluorinated copolymers for microlithography
DU PONT0 citations51
US4383023AMay 10, 1983
Dye mordanting development
DU PONT0 citations51
US7326796B2Feb 5, 2008
Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
DU PONT0 citations41