Inventor
NAGAHAMA ICHIROTA
JP30 patents
⚠️ This page may combine multiple inventors who share the name “NAGAHAMA ICHIROTA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
16 patentsUS6992290B2Jan 31, 2006
Electron beam inspection system and inspection method and method of manufacturing devices using the system
TOSHIBA KK97 citations98
US6909092B2Jun 21, 2005
Electron beam apparatus and device manufacturing method using same
TOSHIBA KK77 citations98
US7241993B2Jul 10, 2007
Inspection system by charged particle beam and method of manufacturing devices using the system
TOSHIBA KK54 citations96
US6563114B1May 13, 2003
Substrate inspecting system using electron beam and substrate inspecting method using electron beam
TOSHIBA KK103 citations96
US8035082B2Oct 11, 2011
Projection electron beam apparatus and defect inspection system using the apparatus
TOSHIBA KK46 citations94
US7212017B2May 1, 2007
Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus
TOSHIBA KK15 citations84
US7075072B2Jul 11, 2006
Detecting apparatus and device manufacturing method
TOSHIBA KK12 citations84
US7211796B2May 1, 2007
Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
TOSHIBA KK6 citations74
US7098457B2Aug 29, 2006
Electron beam apparatus and device manufacturing method using same
TOSHIBA KK6 citations74
US7838831B2Nov 23, 2010
Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method
TOSHIBA KK3 citations63
US7674570B2Mar 9, 2010
Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device
TOSHIBA KK2 citations63
US7645988B2Jan 12, 2010
Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus
TOSHIBA KK2 citations63
US7462829B2Dec 9, 2008
Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
TOSHIBA KK4 citations63
US7148479B2Dec 12, 2006
Defect inspection apparatus, program, and manufacturing method of semiconductor device
TOSHIBA KK3 citations63
US7847250B2Dec 7, 2010
Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
TOSHIBA KK0 citations52
US7608821B2Oct 27, 2009
Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method
TOSHIBA KK0 citations42
EBARA CORP
11 patentsUS9368314B2Jun 14, 2016
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP38 citations98
US8053726B2Nov 8, 2011
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP11 citations93
US7569838B2Aug 4, 2009
Electron beam inspection system and inspection method and method of manufacturing devices using the system
EBARA CORP23 citations93
US7411191B2Aug 12, 2008
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP20 citations93
US7351969B2Apr 1, 2008
Electron beam inspection system and inspection method and method of manufacturing devices using the system
EBARA CORP37 citations93
US8803103B2Aug 12, 2014
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP6 citations84
US7863580B2Jan 4, 2011
Electron beam apparatus and an aberration correction optical apparatus
EBARA CORP7 citations84
US8368031B2Feb 5, 2013
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP3 citations74
US7592586B2Sep 22, 2009
Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample
EBARA CORP5 citations72
US7449691B2Nov 11, 2008
Detecting apparatus and device manufacturing method
EBARA CORP3 citations63
US7352195B2Apr 1, 2008
Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus
EBARA CORP2 citations63