P

Inventor

LUBBEN DANIEL C

US8 patents
⚠️ This page may combine multiple inventors who share the name “LUBBEN DANIEL C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

4 patents
US6852202B2Feb 8, 2005

Small epicyclic magnetron with controlled radial sputtering profile

APPLIED MATERIALS INC48 citations90
US7674360B2Mar 9, 2010

Mechanism for varying the spacing between sputter magnetron and target

APPLIED MATERIALS INC12 citations82
US10047430B2Aug 14, 2018

Self-ionized and inductively-coupled plasma for sputtering and resputtering

APPLIED MATERIALS INC5 citations73
US8764949B2Jul 1, 2014

Prediction and compensation of erosion in a magnetron sputtering target

APPLIED MATERIALS INC1 citations62

DING PEIJUN

2 patents
US8668816B2Mar 11, 2014

Self-ionized and inductively-coupled plasma for sputtering and resputtering

DING PEIJUN19 citations91
US8696875B2Apr 15, 2014

Self-ionized and inductively-coupled plasma for sputtering and resputtering

DING PEIJUN15 citations82

MILLER KEITH A

2 patents
US8133360B2Mar 13, 2012

Prediction and compensation of erosion in a magnetron sputtering target

MILLER KEITH A1 citations60
US8518220B2Aug 27, 2013

Method for predicting and compensating erosion in a magnetron sputtering target

MILLER KEITH A0 citations50