Inventor
OUYANG HSIU
TW2 patents
Patents
2 patentsUS6869837B1Mar 22, 2005
Methods of fabricating a word-line spacer for wide over-etching window on outside diameter (OD) and strong fence
TAIWAN SEMICONDUCTOR MFG11 citations72
US6921695B2Jul 26, 2005
Etching method for forming a square cornered polysilicon wordline electrode
TAIWAN SEMICONDUCTOR MFG3 citations61