Inventor
OHTAKE HIROTO
JP25 patents
⚠️ This page may combine multiple inventors who share the name “OHTAKE HIROTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
13 patentsUS10340123B2Jul 2, 2019
Multi-frequency power modulation for etching high aspect ratio features
TOKYO ELECTRON LTD44 citations94
US9087798B2Jul 21, 2015
Etching method
TOKYO ELECTRON LTD41 citations91
US10529589B2Jan 7, 2020
Method of plasma etching of silicon-containing organic film using sulfur-based chemistry
TOKYO ELECTRON LTD4 citations70
US9305795B2Apr 5, 2016
Plasma processing method
TOKYO ELECTRON LTD3 citations68
US9502537B2Nov 22, 2016
Method of selectively removing a region formed of silicon oxide and plasma processing apparatus
TOKYO ELECTRON LTD1 citations52
US9412607B2Aug 9, 2016
Plasma etching method
TOKYO ELECTRON LTD1 citations50
US9373520B2Jun 21, 2016
Multilayer film etching method and plasma processing apparatus
TOKYO ELECTRON LTD1 citations49
US9105585B2Aug 11, 2015
Etching method
TOKYO ELECTRON LTD1 citations48
US9034698B2May 19, 2015
Semiconductor device manufacturing method
TOKYO ELECTRON LTD0 citations48
US9570312B2Feb 14, 2017
Plasma etching method
TOKYO ELECTRON LTD1 citations47
US10381238B2Aug 13, 2019
Process for performing self-limited etching of organic materials
TOKYO ELECTRON LTD0 citations43
US10410873B2Sep 10, 2019
Power modulation for etching high aspect ratio features
TOKYO ELECTRON LTD0 citations42
US10115591B2Oct 30, 2018
Selective SiARC removal
TOKYO ELECTRON LTD0 citations40
NEC CORP
5 patentsUS7701060B2Apr 20, 2010
Wiring structure and method for manufacturing the same
NEC CORP20 citations92
US6054063AApr 25, 2000
Method for plasma treatment and apparatus for plasma treatment
NEC CORP28 citations92
US7622808B2Nov 24, 2009
Semiconductor device and having trench interconnection
NEC CORP10 citations84
US6972453B2Dec 6, 2005
Method of manufacturing a semiconductor device capable of etching a multi-layer of organic films at a high selectivity
NEC CORP14 citations82
US8043957B2Oct 25, 2011
Semiconductor device, method for manufacturing semiconductor device and apparatus for manufacturing semiconductor
NEC CORP6 citations74