Inventor
HSUEH WEN-CHANG
TW11 patents
Patents
11 patentsUS11740547B2Aug 29, 2023
Method of manufacturing extreme ultraviolet mask with reduced wafer neighboring effect
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US11294271B2Apr 5, 2022
Mask for extreme ultraviolet photolithography
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10996553B2May 4, 2021
Extreme ultraviolet mask with reduced wafer neighboring effect and method of manufacturing the same
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US12019367B2Jun 25, 2024
Mask blanks and methods for depositing layers on mask blank
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11815805B2Nov 14, 2023
Mask for extreme ultraviolet photolithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11531262B2Dec 20, 2022
Mask blanks and methods for depositing layers on mask blank
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11143954B2Oct 12, 2021
Mask patterns and method of manufacture
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US9530200B2Dec 27, 2016
Method and system for inspection of a patterned structure
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations62
US12130548B2Oct 29, 2024
Extreme ultraviolet mask with reduced wafer neighboring effect
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US9429835B2Aug 30, 2016
Structure and method of photomask with reduction of electron-beam scatterring
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations51
US9341940B2May 17, 2016
Reticle and method of fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51