Inventor
CONLEY JR WILLARD E
US4 patents
Patents
4 patentsUS5372912ADec 13, 1994
Radiation-sensitive resist composition and process for its use
IBM55 citations94
US5023164AJun 11, 1991
Highly sensitive dry developable deep UV photoresist
IBM26 citations90
US5567569AOct 22, 1996
Process for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ring
IBM4 citations61
US5552256ASep 3, 1996
Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring
IBM2 citations61