Inventor
ASAKURA RYOJI
JP20 patents
⚠️ This page may combine multiple inventors who share the name “ASAKURA RYOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
19 patentsUS9324588B2Apr 26, 2016
Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP7 citations84
US11410836B2Aug 9, 2022
Analysis method and semiconductor etching apparatus
HITACHI HIGH TECH CORP2 citations73
US10510519B2Dec 17, 2019
Plasma processing apparatus and data analysis apparatus
HITACHI HIGH TECH CORP3 citations73
US10262842B2Apr 16, 2019
Analysis method and semiconductor etching apparatus
HITACHI HIGH TECH CORP2 citations73
US9464936B2Oct 11, 2016
Plasma processing apparatus and analyzing apparatus
HITACHI HIGH TECH CORP3 citations73
US9443704B2Sep 13, 2016
Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP4 citations73
US9091595B2Jul 28, 2015
Analysis method, analysis device, and etching processing system
HITACHI HIGH TECH CORP4 citations73
US11437289B2Sep 6, 2022
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP4 citations71
US12442770B2Oct 14, 2025
Plasma processing apparatus, plasma processing method and plasma processing analysis method
HITACHI HIGH TECH CORP0 citations62
US11538671B2Dec 27, 2022
Plasma processing apparatus and data analysis apparatus
HITACHI HIGH TECH CORP0 citations62
US11404253B2Aug 2, 2022
Plasma processing apparatus and analysis method for analyzing plasma processing data
HITACHI HIGH TECH CORP0 citations62
US10734207B2Aug 4, 2020
Plasma processing apparatus and analysis method for analyzing plasma processing data
HITACHI HIGH TECH CORP1 citations62
US12131964B2Oct 29, 2024
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations61
US12014909B2Jun 18, 2024
Plasma processing apparatus and plasma processing system
HITACHI HIGH TECH CORP0 citations61
US10872750B2Dec 22, 2020
Plasma processing apparatus and plasma processing system
HITACHI HIGH TECH CORP1 citations61
US10408762B2Sep 10, 2019
Plasma processing apparatus, plasma processing method and plasma processing analysis method
HITACHI HIGH TECH CORP0 citations52
US12564002B2Feb 24, 2026
Diagnostic device, semiconductor manufacturing equipment system, semiconductor equipment manufacturing system, and diagnostic method
HITACHI HIGH TECH CORP0 citations50
US12051575B2Jul 30, 2024
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations49
US12062530B2Aug 13, 2024
Vacuum processing apparatus and vacuum processing method
HITACHI HIGH TECH CORP0 citations46