Inventor
KAGOSHIMA AKIRA
JP52 patents
⚠️ This page may combine multiple inventors who share the name “KAGOSHIMA AKIRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
30 patentsUS7107115B2Sep 12, 2006
Method for controlling semiconductor processing apparatus
HITACHI HIGH TECH CORP17 citations93
US9324588B2Apr 26, 2016
Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP7 citations84
US7166480B2Jan 23, 2007
Particle control device and particle control method for vacuum processing apparatus
HITACHI HIGH TECH CORP10 citations84
US7010374B2Mar 7, 2006
Method for controlling semiconductor processing apparatus
HITACHI HIGH TECH CORP15 citations84
US6939435B1Sep 6, 2005
Plasma processing apparatus and processing method
HITACHI HIGH TECH CORP7 citations74
US6908529B2Jun 21, 2005
Plasma processing apparatus and method
HITACHI HIGH TECH CORP8 citations74
US11410836B2Aug 9, 2022
Analysis method and semiconductor etching apparatus
HITACHI HIGH TECH CORP2 citations73
US10510519B2Dec 17, 2019
Plasma processing apparatus and data analysis apparatus
HITACHI HIGH TECH CORP3 citations73
US10262842B2Apr 16, 2019
Analysis method and semiconductor etching apparatus
HITACHI HIGH TECH CORP2 citations73
US9464936B2Oct 11, 2016
Plasma processing apparatus and analyzing apparatus
HITACHI HIGH TECH CORP3 citations73
US9443704B2Sep 13, 2016
Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP4 citations73
US9091595B2Jul 28, 2015
Analysis method, analysis device, and etching processing system
HITACHI HIGH TECH CORP4 citations73
US7330346B2Feb 12, 2008
Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus
HITACHI HIGH TECH CORP6 citations63
US7122096B2Oct 17, 2006
Method and apparatus for processing semiconductor
HITACHI HIGH TECH CORP2 citations63
US12442770B2Oct 14, 2025
Plasma processing apparatus, plasma processing method and plasma processing analysis method
HITACHI HIGH TECH CORP0 citations62
US11643727B2May 9, 2023
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations62
US11538671B2Dec 27, 2022
Plasma processing apparatus and data analysis apparatus
HITACHI HIGH TECH CORP0 citations62
US11404253B2Aug 2, 2022
Plasma processing apparatus and analysis method for analyzing plasma processing data
HITACHI HIGH TECH CORP0 citations62
US10734207B2Aug 4, 2020
Plasma processing apparatus and analysis method for analyzing plasma processing data
HITACHI HIGH TECH CORP1 citations62
US6916396B2Jul 12, 2005
Etching system and etching method
HITACHI HIGH TECH CORP4 citations62
US12014909B2Jun 18, 2024
Plasma processing apparatus and plasma processing system
HITACHI HIGH TECH CORP0 citations61
US11289313B2Mar 29, 2022
Plasma processing apparatus
HITACHI HIGH TECH CORP1 citations61
US10872750B2Dec 22, 2020
Plasma processing apparatus and plasma processing system
HITACHI HIGH TECH CORP1 citations61
US12525442B2Jan 13, 2026
Plasma processing apparatus, data analysis apparatus, and semiconductor device manufacturing system
HITACHI HIGH TECH CORP0 citations56
US10408762B2Sep 10, 2019
Plasma processing apparatus, plasma processing method and plasma processing analysis method
HITACHI HIGH TECH CORP0 citations52
US10262840B2Apr 16, 2019
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations52
US10184182B2Jan 22, 2019
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations52
US10153217B2Dec 11, 2018
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP1 citations52
US9824866B2Nov 21, 2017
Plasma processing method
HITACHI HIGH TECH CORP1 citations52
US7473332B2Jan 6, 2009
Method for processing semiconductor
HITACHI HIGH TECH CORP0 citations52
HITACHI LTD
13 patentsUS6616759B2Sep 9, 2003
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor
HITACHI LTD58 citations95
US7058470B2Jun 6, 2006
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor
HITACHI LTD11 citations93
US6745096B2Jun 1, 2004
Maintenance method and system for plasma processing apparatus etching and apparatus
HITACHI LTD18 citations93
US6706543B2Mar 16, 2004
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor
HITACHI LTD13 citations93
US6733618B2May 11, 2004
Disturbance-free, recipe-controlled plasma processing system and method
HITACHI LTD18 citations92
US7601240B2Oct 13, 2009
Disturbance-free, recipe-controlled plasma processing system and method
HITACHI LTD9 citations84
US6881352B2Apr 19, 2005
Disturbance-free, recipe-controlled plasma processing method
HITACHI LTD12 citations84
US6771481B2Aug 3, 2004
Plasma processing apparatus for processing semiconductor wafer using plasma
HITACHI LTD19 citations84
US7343217B2Mar 11, 2008
System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation
HITACHI LTD4 citations74
US6828165B2Dec 7, 2004
Semiconductor plasma processing apparatus with first and second processing state monitoring units
HITACHI LTD10 citations74
US6776872B2Aug 17, 2004
Data processing apparatus for semiconductor processing apparatus
HITACHI LTD7 citations74
US7062347B2Jun 13, 2006
Maintenance method and system for plasma processing apparatus
HITACHI LTD3 citations63
US6830649B2Dec 14, 2004
Apparatus and method for producing semiconductors
HITACHI LTD6 citations63
MORISAWA TOSHIHIRO
3 patentsUS9110461B2Aug 18, 2015
Semiconductor manufacturing equipment
MORISAWA TOSHIHIRO13 citations82
US8924001B2Dec 30, 2014
Etching apparatus, control simulator, and semiconductor device manufacturing method
MORISAWA TOSHIHIRO5 citations71
US8282849B2Oct 9, 2012
Etching process state judgment method and system therefor
MORISAWA TOSHIHIRO3 citations61
KAGOSHIMA AKIRA
2 patentsUCHIDA HIROSHIGE
1 patentKIMURA SHINGO
1 patentShowing the top 50 of 52 patents by PatentIndex Score.