Inventor
SHIRAISHI DAISUKE
JP68 patents
⚠️ This page may combine multiple inventors who share the name “SHIRAISHI DAISUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
21 patentsUS9324588B2Apr 26, 2016
Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP7 citations84
US7166480B2Jan 23, 2007
Particle control device and particle control method for vacuum processing apparatus
HITACHI HIGH TECH CORP10 citations84
US6908529B2Jun 21, 2005
Plasma processing apparatus and method
HITACHI HIGH TECH CORP8 citations74
US11410836B2Aug 9, 2022
Analysis method and semiconductor etching apparatus
HITACHI HIGH TECH CORP2 citations73
US10510519B2Dec 17, 2019
Plasma processing apparatus and data analysis apparatus
HITACHI HIGH TECH CORP3 citations73
US10262842B2Apr 16, 2019
Analysis method and semiconductor etching apparatus
HITACHI HIGH TECH CORP2 citations73
US9464936B2Oct 11, 2016
Plasma processing apparatus and analyzing apparatus
HITACHI HIGH TECH CORP3 citations73
US9443704B2Sep 13, 2016
Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus
HITACHI HIGH TECH CORP4 citations73
US9091595B2Jul 28, 2015
Analysis method, analysis device, and etching processing system
HITACHI HIGH TECH CORP4 citations73
US7330346B2Feb 12, 2008
Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus
HITACHI HIGH TECH CORP6 citations63
US7122096B2Oct 17, 2006
Method and apparatus for processing semiconductor
HITACHI HIGH TECH CORP2 citations63
US12442770B2Oct 14, 2025
Plasma processing apparatus, plasma processing method and plasma processing analysis method
HITACHI HIGH TECH CORP0 citations62
US11643727B2May 9, 2023
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations62
US11538671B2Dec 27, 2022
Plasma processing apparatus and data analysis apparatus
HITACHI HIGH TECH CORP0 citations62
US11404253B2Aug 2, 2022
Plasma processing apparatus and analysis method for analyzing plasma processing data
HITACHI HIGH TECH CORP0 citations62
US10734207B2Aug 4, 2020
Plasma processing apparatus and analysis method for analyzing plasma processing data
HITACHI HIGH TECH CORP1 citations62
US6916396B2Jul 12, 2005
Etching system and etching method
HITACHI HIGH TECH CORP4 citations62
US12014909B2Jun 18, 2024
Plasma processing apparatus and plasma processing system
HITACHI HIGH TECH CORP0 citations61
US11289313B2Mar 29, 2022
Plasma processing apparatus
HITACHI HIGH TECH CORP1 citations61
US10872750B2Dec 22, 2020
Plasma processing apparatus and plasma processing system
HITACHI HIGH TECH CORP1 citations61
US12525442B2Jan 13, 2026
Plasma processing apparatus, data analysis apparatus, and semiconductor device manufacturing system
HITACHI HIGH TECH CORP0 citations56
CANON KK
9 patentsUS7962678B2Jun 14, 2011
Bus arbitration apparatus and method
CANON KK7 citations83
US10495842B2Dec 3, 2019
Lens barrel
CANON KK2 citations73
US12554406B2Feb 17, 2026
Memory control apparatus and memory control method
CANON KK0 citations63
US7720979B2May 18, 2010
Communication apparatus
CANON KK2 citations63
US12211541B2Jan 28, 2025
Memory controller, control method for memory controller, and storage medium
CANON KK0 citations62
US11842079B2Dec 12, 2023
Memory controller and memory control method that decides an order of issuing dram commands based on whether a command has a penalty period
CANON KK1 citations62
US11756593B2Sep 12, 2023
Memory control circuit, information processing system, and memory control method
CANON KK0 citations62
US11435951B2Sep 6, 2022
DRAM access technique to reduce latency due to write command length
CANON KK0 citations62
US11290647B2Mar 29, 2022
Lens apparatus, image pickup apparatus, and camera system
CANON KK0 citations62
HITACHI LTD
5 patentsUS6616759B2Sep 9, 2003
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor
HITACHI LTD58 citations95
US7058470B2Jun 6, 2006
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor
HITACHI LTD11 citations93
US6706543B2Mar 16, 2004
Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor
HITACHI LTD13 citations93
US7343217B2Mar 11, 2008
System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation
HITACHI LTD4 citations74
US6828165B2Dec 7, 2004
Semiconductor plasma processing apparatus with first and second processing state monitoring units
HITACHI LTD10 citations74
MORISAWA TOSHIHIRO
4 patentsUS9110461B2Aug 18, 2015
Semiconductor manufacturing equipment
MORISAWA TOSHIHIRO13 citations82
US8924001B2Dec 30, 2014
Etching apparatus, control simulator, and semiconductor device manufacturing method
MORISAWA TOSHIHIRO5 citations71
US8486290B2Jul 16, 2013
Etching apparatus, analysis apparatus, etching treatment method, and etching treatment program
MORISAWA TOSHIHIRO5 citations71
US8282849B2Oct 9, 2012
Etching process state judgment method and system therefor
MORISAWA TOSHIHIRO3 citations61
KAGOSHIMA AKIRA
2 patentsSHIRAISHI DAISUKE
2 patentsUS8737393B2May 27, 2014
Communication apparatus, control method for communication apparatus, and computer program
SHIRAISHI DAISUKE2 citations61
US8341453B2Dec 25, 2012
Transmission apparatus that transmits data according to a protocol, and method for measuring time in the transmission apparatus
SHIRAISHI DAISUKE4 citations60
KANEKO SHUHEI
1 patentOLYMPUS IMAGING CORP
1 patentOLYMPUS CORP
1 patentSK HYNIX INC
1 patentMINAMI TOSHIAKI
1 patentUCHIDA HIROSHIGE
1 patentTOYOTA MOTOR CO LTD
1 patentShowing the top 50 of 68 patents by PatentIndex Score.