P

Inventor

MASUDA TOSHIO

JP65 patents
⚠️ This page may combine multiple inventors who share the name “MASUDA TOSHIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI LTD

21 patents
US6171438B1Jan 9, 2001

Plasma processing apparatus and plasma processing method

HITACHI LTD100 citations99
US6755932B2Jun 29, 2004

Plasma processing system and apparatus and a sample processing method

HITACHI LTD290 citations98
US6245190B1Jun 12, 2001

Plasma processing system and plasma processing method

HITACHI LTD194 citations98
US6503364B1Jan 7, 2003

Plasma processing apparatus

HITACHI LTD92 citations97
US6422172B1Jul 23, 2002

Plasma processing apparatus and plasma processing method

HITACHI LTD100 citations97
US6815365B2Nov 9, 2004

Plasma etching apparatus and plasma etching method

HITACHI LTD44 citations96
US6616759B2Sep 9, 2003

Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor

HITACHI LTD58 citations95
US6506686B2Jan 14, 2003

Plasma processing apparatus and plasma processing method

HITACHI LTD52 citations95
US7058470B2Jun 6, 2006

Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor

HITACHI LTD11 citations93
US6745096B2Jun 1, 2004

Maintenance method and system for plasma processing apparatus etching and apparatus

HITACHI LTD18 citations93
US6706543B2Mar 16, 2004

Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor

HITACHI LTD13 citations93
US6733618B2May 11, 2004

Disturbance-free, recipe-controlled plasma processing system and method

HITACHI LTD18 citations92
US5893978AApr 13, 1999

Purifying method and purification system for lakes and marshes

HITACHI LTD50 citations91
US7601240B2Oct 13, 2009

Disturbance-free, recipe-controlled plasma processing system and method

HITACHI LTD9 citations84
US6881352B2Apr 19, 2005

Disturbance-free, recipe-controlled plasma processing method

HITACHI LTD12 citations84
US7343217B2Mar 11, 2008

System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation

HITACHI LTD4 citations74
US6828165B2Dec 7, 2004

Semiconductor plasma processing apparatus with first and second processing state monitoring units

HITACHI LTD10 citations74
US6776872B2Aug 17, 2004

Data processing apparatus for semiconductor processing apparatus

HITACHI LTD7 citations74
US6923885B2Aug 2, 2005

Plasma processing system and apparatus and a sample processing method

HITACHI LTD11 citations73
US7062347B2Jun 13, 2006

Maintenance method and system for plasma processing apparatus

HITACHI LTD3 citations63
US7048869B2May 23, 2006

Plasma processing apparatus and a plasma processing method

HITACHI LTD6 citations63

FUJI HEAVY IND LTD

12 patents

HITACHI HIGH TECH CORP

3 patents

MASUDA TOSHIO

3 patents

PENTAX CORP

2 patents

HIGASHIMURA TOSHINOBU

2 patents

FUJI JUKOSYO KABUSHIKI KAISHA

1 patent

HOYA CORP

1 patent

HITCHI HIGH TECHNOLOGIES CORP

1 patent

SHIKAI MASAHIRO

1 patent

TORAY INDUSTRIES

1 patent

MITSUBISHI ELECTRIC CORP

1 patent

ZEON KASAI CO LTD

1 patent

Showing the top 50 of 65 patents by PatentIndex Score.