Inventor
DELIA PETER
US6 patents
Patents
6 patentsUS12148624B2Nov 19, 2024
Wet etch process and method to control fin height and channel area in a fin field effect transistor (FinFET)
TOKYO ELECTRON LTD0 citations59
US12100598B2Sep 24, 2024
Methods for planarizing a substrate using a combined wet etch and chemical mechanical polishing (CMP) process
TOKYO ELECTRON LTD1 citations59
US12243749B2Mar 4, 2025
Methods to provide uniform wet etching of material within high aspect ratio features provided on a patterned substrate
TOKYO ELECTRON LTD0 citations58
US12100599B2Sep 24, 2024
Wet etch process and method to provide uniform etching of material formed within features having different critical dimension (CD)
TOKYO ELECTRON LTD0 citations58
US12482702B2Nov 25, 2025
Wet etch process and methods to form air gaps between metal interconnects
TOKYO ELECTRON LTD0 citations48
US12148625B2Nov 19, 2024
Methods to prevent surface charge induced cd-dependent etching of material formed within features on a patterned substrate
TOKYO ELECTRON LTD0 citations48