Inventor

LIEBMANN LARS W

US118 patents

⚠️ This page may combine multiple inventors who share the name “LIEBMANN LARS W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LIEBMANN LARS W

IBM

Process window based optical proximity correction of lithographic images

Vertex minimization in a smart optical proximity correction system

Vertex minimization in a smart optical proximity correction system

Gate tie-down enablement with inner spacer

Pliant SRAF for improved performance and manufacturability

Binary OPC for assist feature layout optimization

Generating mask patterns for alternating phase-shift mask lithography

Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensions

Optimized alternating phase shifted mask design

Optimized phase shift design migration

Phase shifted mask design system, phase shifted mask and VLSI circuit devices manufactured therewith

Lithographic patterning method and mask set therefor with light field trim mask

Simple repair method for phase shifting masks

Geometric autogeneration of&#34;hard&#34;phase-shift designs for VLSI

Geometric autogeneration of &#34;hard&#34; phase-shift designs for VLSI

Automatic generation of phase shift masks using net coloring

Exact transmission balanced alternating phase-shifting mask for photolithography

Phase shifted design verification routine

Physical design system and method

Method for generating a proximity model based on proximity rules

Method for automatically eliminating three way intersection design conflicts in phase edge, phase shift designs

Split-layer design for double patterning lithography

Integrated lithographic layout optimization

Method for incorporating sub resolution assist features in a photomask layout

Efficient generation of negative fill shapes for chips and packages

Self aligned via in integrated circuit

Reducing color conflicts in triple patterning lithography

Electrically driven optical proximity correction

Binary OPC for assist feature layout optimization

Method for verification of resolution enhancement techniques and optical proximity correction in lithography

Pitch-based subresolution assist feature design

Phase-width balanced alternating phase shift mask design

Alternating phase shift mask design with optimized phase shapes

Priority coloring for VLSI designs

Focus monitor for alternating phase shifted masks

Automatic generation of phase shift masks using net coloring

High resolution phase edge lithography without the need for a trim mask

Closed-loop design for manufacturability process

GLOBALFOUNDRIES INC

Hybrid gate-all-around (GAA) field effect transistor (FET) structure and method of forming

Self aligned buried power rail

Methods of forming gate contact structures and cross-coupled contact structures for transistor devices

Fin cut with alternating two color fin hardmask

Method of forming complementary nano-sheet/wire transistor devices with same depth contacts

Methods of forming gate contact structures and cross-coupled contact structures for transistor devices

AGARWAL KANAK B

Electrically-driven optical proximity correction to compensate for non-optical effects

Method for post decomposition density balancing in integrated circuit layouts, related system and program product

INFINEON TECHNOLOGIES AG

Semiconductor device fabrication using a photomask with assist features

OUYANG XU

Placement and optimization of process dummy cells

ABOU GHAIDA RANI S

Multiple patterning layout decomposition for ease of conflict removal

GLOBALFOUNDRIES US INC

Middle of the line self-aligned direct pattern contacts

Geometric autogeneration of"hard"phase-shift designs for VLSI

Geometric autogeneration of "hard" phase-shift designs for VLSI