Inventor
RAFAC ROBERT JAY
US25 patents
⚠️ This page may combine multiple inventors who share the name “RAFAC ROBERT JAY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
22 patentsUS9820368B2Nov 14, 2017
Target expansion rate control in an extreme ultraviolet light source
ASML NETHERLANDS BV5 citations83
US9713240B2Jul 18, 2017
Stabilizing EUV light power in an extreme ultraviolet light source
ASML NETHERLANDS BV7 citations83
US9426872B1Aug 23, 2016
System and method for controlling source laser firing in an LPP EUV light source
ASML NETHERLANDS BV9 citations83
US9832852B1Nov 28, 2017
EUV LPP source with dose control and laser stabilization using variable width laser pulses
ASML NETHERLANDS BV6 citations73
US8866110B2Oct 21, 2014
Extreme ultraviolet light source
ASML NETHERLANDS BV5 citations73
US11096266B2Aug 17, 2021
Target expansion rate control in an extreme ultraviolet light source
ASML NETHERLANDS BV2 citations72
US10674591B2Jun 2, 2020
Target expansion rate control in an extreme ultraviolet light source
ASML NETHERLANDS BV1 citations72
US10401704B2Sep 3, 2019
Compensating for a physical effect in an optical system
ASML NETHERLANDS BV2 citations72
US10314153B2Jun 4, 2019
Target expansion rate control in an extreme ultraviolet light source
ASML NETHERLANDS BV2 citations72
US9980359B2May 22, 2018
Systems and methods for controlling EUV energy generation using pulse intensity
ASML NETHERLANDS BV4 citations72
US10667377B2May 26, 2020
Extreme ultraviolet light source
ASML NETHERLANDS BV2 citations71
US9462668B2Oct 4, 2016
Target for extreme ultraviolet light source
ASML NETHERLANDS BV3 citations68
US11266002B2Mar 1, 2022
System for monitoring a plasma
ASML NETHERLANDS BV3 citations67
US12238848B2Feb 25, 2025
EUV light source target metrology
ASML NETHERLANDS BV0 citations62
US12078934B2Sep 3, 2024
Laser system for target metrology and alteration in an EUV light source
ASML NETHERLANDS BV0 citations62
US11758639B2Sep 12, 2023
Determining moving properties of a target in an extreme ultraviolet light source
ASML NETHERLANDS BV1 citations62
US10904993B2Jan 26, 2021
Reducing the effect of plasma on an object in an extreme ultraviolet light source
ASML NETHERLANDS BV0 citations59
US10349509B2Jul 9, 2019
Reducing the effect of plasma on an object in an extreme ultraviolet light source
ASML NETHERLANDS BV1 citations59
US12171053B2Dec 17, 2024
System for monitoring a plasma
ASML NETHERLANDS BV0 citations56
US12369244B2Jul 22, 2025
Laser system for source material conditioning in an EUV light source
ASML NETHERLANDS BV0 citations51
US9832854B2Nov 28, 2017
Systems and methods for stabilization of droplet-plasma interaction via laser energy modulation
ASML NETHERLANDS BV0 citations41
US10663866B2May 26, 2020
Wavelength-based optical filtering
ASML NETHERLANDS BV0 citations39