Inventor
OIE Toshiyuki
JP14 patents
Patents
14 patentsUS10035978B2Jul 31, 2018
Semiconductor element cleaning liquid and cleaning method
MITSUBISHI GAS CHEMICAL CO9 citations83
US10629426B2Apr 21, 2020
Semiconductor element cleaning solution that suppresses damage to cobalt, and method for cleaning semiconductor element using same
MITSUBISHI GAS CHEMICAL CO2 citations72
US10377978B2Aug 13, 2019
Alkaline earth metal-containing cleaning solution for cleaning semiconductor element, and method for cleaning semiconductor element using same
MITSUBISHI GAS CHEMICAL CO2 citations72
US9422512B2Aug 23, 2016
Cleaning liquid for semiconductor elements and cleaning method using same
MITSUBISHI GAS CHEMICAL CO4 citations70
US10651028B2May 12, 2020
Semiconductor element cleaning solution that suppresses damage to tungsten-containing materials, and method for cleaning semiconductor element using same
MITSUBISHI GAS CHEMICAL CO1 citations62
US10689573B2Jun 23, 2020
Wet etching composition for substrate having SiN layer and Si layer and wet etching method using same
MITSUBISHI GAS CHEMICAL CO1 citations61
US11479744B2Oct 25, 2022
Composition having suppressed alumina damage and production method for semiconductor substrate using same
MITSUBISHI GAS CHEMICAL CO0 citations59
US11352593B2Jun 7, 2022
Aqueous composition and cleaning method using same
MITSUBISHI GAS CHEMICAL CO0 citations59
US12338381B2Jun 24, 2025
Protective fluid for alumina, protection method, and production method for semiconductor substrate having alumina layer using same
MITSUBISHI GAS CHEMICAL CO0 citations57
US11193094B2Dec 7, 2021
Liquid composition for reducing damage of cobalt, alumina, interlayer insulating film and silicon nitride, and washing method using same
MITSUBISHI GAS CHEMICAL CO0 citations57
US10538718B2Jan 21, 2020
Cleaning solution and cleaning method for material comprising carbon-incorporated silicon oxide for use in recycling wafer
MITSUBISHI GAS CHEMICAL CO0 citations51
US10160938B2Dec 25, 2018
Semiconductor element cleaning solution that suppresses damage to tantalum-containing materials, and cleaning method using same
MITSUBISHI GAS CHEMICAL CO0 citations51
US11629315B2Apr 18, 2023
Aqueous composition and cleaning method using same
MITSUBISHI GAS CHEMICAL CO0 citations48
US11613720B2Mar 28, 2023
Aqueous composition and cleaning method using same
MITSUBISHI GAS CHEMICAL CO0 citations48