Inventor
SUZUKI HIDENAO
JP49 patents
⚠️ This page may combine multiple inventors who share the name “SUZUKI HIDENAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEIKO EPSON CORP
29 patentsUS9421781B2Aug 23, 2016
Recording apparatus
SEIKO EPSON CORP27 citations94
USD836113SDec 18, 2018
Recording apparatus
SEIKO EPSON CORP8 citations84
USD802050SNov 7, 2017
Ink tank container for a printer
SEIKO EPSON CORP13 citations84
US9505224B2Nov 29, 2016
Recording apparatus
SEIKO EPSON CORP4 citations84
US9493010B2Nov 15, 2016
Liquid container
SEIKO EPSON CORP9 citations84
US9427972B2Aug 30, 2016
Recording apparatus
SEIKO EPSON CORP9 citations84
US9855761B2Jan 2, 2018
Ink tank unit, ink jet printer, and ink tank
SEIKO EPSON CORP5 citations82
US9908337B2Mar 6, 2018
Recording apparatus
SEIKO EPSON CORP2 citations73
US9868290B2Jan 16, 2018
Liquid container, liquid supply device and liquid jet system
SEIKO EPSON CORP3 citations73
US9707769B2Jul 18, 2017
Recording apparatus
SEIKO EPSON CORP4 citations73
US9643421B2May 9, 2017
Recording apparatus
SEIKO EPSON CORP2 citations73
US9481180B2Nov 1, 2016
Liquid container, liquid container unit, liquid ejecting system, and liquid ejecting apparatus
SEIKO EPSON CORP4 citations73
US9409407B2Aug 9, 2016
Liquid ejection apparatus and tank
SEIKO EPSON CORP3 citations73
US9381748B2Jul 5, 2016
Liquid ejection device
SEIKO EPSON CORP4 citations73
US9487012B2Nov 8, 2016
Ink tank unit, ink jet printer, and ink tank
SEIKO EPSON CORP3 citations71
US10343409B2Jul 9, 2019
Liquid jet apparatus, tank unit, and printer
SEIKO EPSON CORP5 citations70
USD962941SSep 6, 2022
Recording apparatus
SEIKO EPSON CORP0 citations63
US10981390B2Apr 20, 2021
Liquid container and liquid injection apparatus
SEIKO EPSON CORP0 citations63
US9511591B2Dec 6, 2016
Recording apparatus
SEIKO EPSON CORP2 citations63
US10105959B2Oct 23, 2018
Liquid supplying apparatus, liquid ejecting apparatus, and liquid container unit
SEIKO EPSON CORP0 citations52
US10011118B2Jul 3, 2018
Recording apparatus
SEIKO EPSON CORP0 citations52
US9643423B2May 9, 2017
Liquid container with optically transparent area and liquid ejection apparatus including liquid container with visual recognition portion
SEIKO EPSON CORP1 citations52
US9586408B2Mar 7, 2017
Liquid ejection device
SEIKO EPSON CORP1 citations52
US9555639B2Jan 31, 2017
Liquid supplying apparatus, liquid ejecting apparatus, and liquid container unit
SEIKO EPSON CORP1 citations52
US9254666B2Feb 9, 2016
Liquid ejecting apparatus
SEIKO EPSON CORP1 citations52
US9144986B2Sep 29, 2015
Recording apparatus
SEIKO EPSON CORP0 citations52
US8382091B2Feb 26, 2013
Recording apparatus
SEIKO EPSON CORP0 citations52
US9399350B2Jul 26, 2016
Liquid ejecting system, liquid ejecting apparatus, and containing unit
SEIKO EPSON CORP0 citations42
US10183491B2Jan 22, 2019
Cap attached to ink tank of printer
SEIKO EPSON CORP0 citations37
EBARA CORP
15 patentsUS6282368B1Aug 28, 2001
Liquid feed vaporization system and gas injection device
EBARA CORP104 citations99
US6132512AOct 17, 2000
Vapor-phase film growth apparatus and gas ejection head
EBARA CORP225 citations99
US5951923ASep 14, 1999
Vaporizer apparatus and film deposition apparatus therewith
EBARA CORP275 citations99
US6387182B1May 14, 2002
Apparatus and method for processing substrate
EBARA CORP113 citations97
US6195504B1Feb 27, 2001
Liquid feed vaporization system and gas injection device
EBARA CORP58 citations96
US6269221B1Jul 31, 2001
Liquid feed vaporization system and gas injection device
EBARA CORP16 citations92
US6116267ASep 12, 2000
Valving device
EBARA CORP29 citations92
US5950646ASep 14, 1999
Vapor feed supply system
EBARA CORP23 citations92
US7169705B2Jan 30, 2007
Plating method and plating apparatus
EBARA CORP43 citations91
US5395474AMar 7, 1995
Apparatus and method for etching semiconductor wafer
EBARA CORP23 citations89
US7736474B2Jun 15, 2010
Plating apparatus and plating method
EBARA CORP8 citations82
US6312569B1Nov 6, 2001
Chemical vapor deposition apparatus and cleaning method thereof
EBARA CORP11 citations73
US5432342AJul 11, 1995
Method of and apparatus for generating low-energy neutral particle beam
EBARA CORP9 citations73
US7479213B2Jan 20, 2009
Plating method and plating apparatus
EBARA CORP4 citations61
US7374646B2May 20, 2008
Electrolytic processing apparatus and substrate processing method
EBARA CORP2 citations61