Inventor
SAKAI YOSHIKA
JP11 patents
Patents
11 patentsUS5736296AApr 7, 1998
Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound
TOKYO OHKA KOGYO CO LTD46 citations96
US5955240ASep 21, 1999
Positive resist composition
TOKYO OHKA KOGYO CO LTD23 citations92
US5948589ASep 7, 1999
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD20 citations92
US5908730AJun 1, 1999
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD35 citations92
US5817444AOct 6, 1998
Positive-working photoresist composition and multilayered resist material using the same
TOKYO OHKA KOGYO CO LTD35 citations92
US5770343AJun 23, 1998
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD15 citations82
US6159652ADec 12, 2000
Positive resist composition
TOKYO OHKA KOGYO CO LTD12 citations73
US5945248AAug 31, 1999
Chemical-sensitization positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD14 citations73
US5874195AFeb 23, 1999
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD9 citations73
US5856058AJan 5, 1999
Chemical-sensitization positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD2 citations62
US5854357ADec 29, 1998
Process for the production of polyhydroxstyrene
TOKYO OHKA KOGYO CO LTD3 citations62