P

Inventor

TRAN MINH QUOC

US18 patents
⚠️ This page may combine multiple inventors who share the name “TRAN MINH QUOC”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED MICRO DEVICES INC

16 patents
US6566248B1May 20, 2003

Graphoepitaxial conductor cores in integrated circuit interconnects

ADVANCED MICRO DEVICES INC72 citations96
US6609946B1Aug 26, 2003

Method and system for polishing a semiconductor wafer

ADVANCED MICRO DEVICES INC41 citations92
US7208418B1Apr 24, 2007

Sealing sidewall pores in low-k dielectrics

ADVANCED MICRO DEVICES INC13 citations84
US6425991B1Jul 30, 2002

Plating system with secondary ring anode for a semiconductor wafer

ADVANCED MICRO DEVICES INC14 citations84
US7256499B1Aug 14, 2007

Ultra low dielectric constant integrated circuit system

ADVANCED MICRO DEVICES INC8 citations74
US6583051B2Jun 24, 2003

Method of manufacturing an amorphized barrier layer for integrated circuit interconnects

ADVANCED MICRO DEVICES INC7 citations74
US6348732B1Feb 19, 2002

Amorphized barrier layer for integrated circuit interconnects

ADVANCED MICRO DEVICES INC8 citations74
US6541286B1Apr 1, 2003

Imaging of integrated circuit interconnects

ADVANCED MICRO DEVICES INC12 citations73
US6756300B1Jun 29, 2004

Method for forming dual damascene interconnect structure

ADVANCED MICRO DEVICES INC6 citations63
US6649034B1Nov 18, 2003

Electro-chemical metal alloying for semiconductor manufacturing

ADVANCED MICRO DEVICES INC2 citations63
US6501177B1Dec 31, 2002

Atomic layer barrier layer for integrated circuit interconnects

ADVANCED MICRO DEVICES INC5 citations63
US6455413B1Sep 24, 2002

Pre-fill CMP and electroplating method for integrated circuits

ADVANCED MICRO DEVICES INC3 citations62
US6413390B1Jul 2, 2002

Plating system with remote secondary anode for semiconductor manufacturing

ADVANCED MICRO DEVICES INC4 citations62
US6402909B1Jun 11, 2002

Plating system with shielded secondary anode for semiconductor manufacturing

ADVANCED MICRO DEVICES INC5 citations62
US7001840B1Feb 21, 2006

Interconnect with multiple layers of conductive material with grain boundary between the layers

ADVANCED MICRO DEVICES INC2 citations60
US6504251B1Jan 7, 2003

Heat/cold amorphized barrier layer for integrated circuit interconnects

ADVANCED MICRO DEVICES INC0 citations52

NICKEL ALEXANDER H

1 patent

APPLIED MATERIALS INC

1 patent