Inventor
XUE JUN
JP39 patents
⚠️ This page may combine multiple inventors who share the name “XUE JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
14 patentsUS9502258B2Nov 22, 2016
Anisotropic gap etch
APPLIED MATERIALS INC129 citations98
US9412613B2Aug 9, 2016
Development of high etch selective hardmask material by ion implantation into amorphous carbon films
APPLIED MATERIALS INC54 citations98
US9190290B2Nov 17, 2015
Halogen-free gas-phase silicon etch
APPLIED MATERIALS INC97 citations98
US9777378B2Oct 3, 2017
Advanced process flow for high quality FCVD films
APPLIED MATERIALS INC18 citations84
US9502262B2Nov 22, 2016
Nanocrystalline diamond carbon film for 3D NAND hardmask application
APPLIED MATERIALS INC5 citations84
US10096466B2Oct 9, 2018
Pulsed plasma for film deposition
APPLIED MATERIALS INC4 citations73
US9865464B2Jan 9, 2018
Nanocrystalline diamond carbon film for 3D NAND hardmask application
APPLIED MATERIALS INC2 citations73
US9852902B2Dec 26, 2017
Material deposition for high aspect ratio structures
APPLIED MATERIALS INC3 citations72
US9620407B2Apr 11, 2017
3D material modification for advanced processing
APPLIED MATERIALS INC3 citations72
US9595467B2Mar 14, 2017
Air gap formation in interconnection structure by implantation process
APPLIED MATERIALS INC0 citations52
US9534289B2Jan 3, 2017
Plasma process chambers employing distribution grids having focusing surfaces thereon enabling angled fluxes to reach a substrate, and related methods
APPLIED MATERIALS INC1 citations52
US10276369B2Apr 30, 2019
Material deposition for high aspect ratio structures
APPLIED MATERIALS INC0 citations51
US9773675B2Sep 26, 2017
3D material modification for advanced processing
APPLIED MATERIALS INC0 citations51
US9382625B2Jul 5, 2016
Remote plasma source based cyclic CVD process for nanocrystalline diamond deposition
APPLIED MATERIALS INC0 citations42
LAM RES CORP
9 patentsUS11988965B2May 21, 2024
Underlayer for photoresist adhesion and dose reduction
LAM RES CORP13 citations93
US11314168B2Apr 26, 2022
Underlayer for photoresist adhesion and dose reduction
LAM RES CORP24 citations93
US12474638B2Nov 18, 2025
Underlayer for photoresist adhesion and dose reduction
LAM RES CORP2 citations74
US12474640B2Nov 18, 2025
Integration of dry development and etch processes for EUV patterning in a single process chamber
LAM RES CORP4 citations71
US12062537B2Aug 13, 2024
High etch selectivity, low stress ashable carbon hard mask
LAM RES CORP0 citations61
US12586765B2Mar 24, 2026
Surface modification for metal-containing photoresist deposition
LAM RES CORP0 citations51
US12550646B2Feb 10, 2026
Selectively etching for nanowires
LAM RES CORP0 citations51
US11521860B2Dec 6, 2022
Selectively etching for nanowires
LAM RES CORP0 citations48
US12435412B2Oct 7, 2025
High density, modulus, and hardness amorphous carbon films at low pressure
LAM RES CORP0 citations44
TENCENT TECH SHENZHEN CO LTD
6 patentsUS9619107B2Apr 11, 2017
Methods and systems for dynamically displaying icons on a user interface for security check and other functions
TENCENT TECH SHENZHEN CO LTD2 citations68
US11157576B2Oct 26, 2021
Method, system and terminal for performing search in a browser
TENCENT TECH SHENZHEN CO LTD0 citations59
US10643021B2May 5, 2020
Method and device for processing web page content
TENCENT TECH SHENZHEN CO LTD0 citations52
US10019414B2Jul 10, 2018
Method and device for processing web page content
TENCENT TECH SHENZHEN CO LTD0 citations52
US10152546B2Dec 11, 2018
Method, system and terminal for performing search in a browser
TENCENT TECH SHENZHEN CO LTD0 citations49
US9313321B2Apr 12, 2016
Screen unlocking method and device for mobile terminal
TENCENT TECH SHENZHEN CO LTD0 citations42