Inventor
SUNG DOUG YONG
KR18 patents
⚠️ This page may combine multiple inventors who share the name “SUNG DOUG YONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
17 patentsUS9378931B2Jun 28, 2016
Pulse plasma apparatus and drive method thereof
SAMSUNG ELECTRONICS CO LTD39 citations91
US10395900B2Aug 27, 2019
Plasma processing apparatus
SAMSUNG ELECTRONICS CO LTD7 citations82
US9564295B2Feb 7, 2017
Diagnosis system for pulsed plasma
SAMSUNG ELECTRONICS CO LTD7 citations82
US9601397B1Mar 21, 2017
Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the system
SAMSUNG ELECTRONICS CO LTD4 citations71
US10229818B2Mar 12, 2019
Apparatus for monitoring process chamber
SAMSUNG ELECTRONICS CO LTD2 citations70
US10481005B2Nov 19, 2019
Semiconductor substrate measuring apparatus and plasma treatment apparatus using the same
SAMSUNG ELECTRONICS CO LTD3 citations68
US10964511B2Mar 30, 2021
Semiconductor manufacturing device and method of operating the same
SAMSUNG ELECTRONICS CO LTD2 citations67
US10903053B2Jan 26, 2021
Plasma processing apparatus
SAMSUNG ELECTRONICS CO LTD0 citations61
US10971343B2Apr 6, 2021
Apparatus for monitoring process chamber
SAMSUNG ELECTRONICS CO LTD0 citations60
US12437969B2Oct 7, 2025
Plasma processing equipment
SAMSUNG ELECTRONICS CO LTD0 citations58
US11501953B2Nov 15, 2022
Plasma processing equipment
SAMSUNG ELECTRONICS CO LTD0 citations58
US11735396B2Aug 22, 2023
Inductively coupled plasma processing apparatus
SAMSUNG ELECTRONICS CO LTD1 citations56
US12518953B2Jan 6, 2026
Plasma processing apparatus and method of manufacture
SAMSUNG ELECTRONICS CO LTD0 citations54
US12046451B2Jul 23, 2024
Plasma etching apparatus and method for operating the same
SAMSUNG ELECTRONICS CO LTD0 citations50
US10629467B2Apr 21, 2020
Electrostatic chuck and plasma apparatus for processing substrates having the same
SAMSUNG ELECTRONICS CO LTD0 citations50
US10566176B2Feb 18, 2020
Microwave probe, plasma monitoring system including the microwave probe, and method for fabricating semiconductor device using the system
SAMSUNG ELECTRONICS CO LTD0 citations50
US10276349B2Apr 30, 2019
Plasma processing device
SAMSUNG ELECTRONICS CO LTD0 citations36