Inventor

KAWAI HIDEMI

JP21 patents

⚠️ This page may combine multiple inventors who share the name “KAWAI HIDEMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KAWAI HIDEMI

NIKON CORP

Projection exposure apparatus

Cleanup method for optics in immersion lithography

Scanning exposure method

Apparatus for detecting position of reference pattern

Projection exposure method in which mask patterns are imaged on photosensitive substrates with adjustment of illumination and projection parameters corresponding to the mask pattern

Scanning type exposure method

Projection exposure method and method of manufacturing a projection exposure apparatus

Alignment method

Apparatus and method for detecting alignment marks having alignment optical systems&#39; driving means

Cleanup method for optics in immersion lithography using object on wafer holder in place of wafer

Processing system, processing method, computer program, recording medium, and control apparatus

NIPPON KOGAKU KK

Projection exposure apparatus

Projection optical apparatus for mask to substrate alignment

Projection optical apparatus

Method of aligning a semiconductor substrate and a photomask

Scanning exposure method

KAWAI HIDEMI

Cleanup method for optics in immersion lithography with cleaning liquid opposed by a surface of object

Cleanup method for optics in immersion lithography using bubbles

Cleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery port

Cleanup method for optics in immersion lithography supplying cleaning liquid at different times than immersion liquid

Cleanup method for optics in immersion lithography using sonic device

Apparatus and method for detecting alignment marks having alignment optical systems' driving means