Inventor
CHOI YOUN SUNG
US24 patents
⚠️ This page may combine multiple inventors who share the name “CHOI YOUN SUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TEXAS INSTRUMENTS INC
12 patentsUS9093298B2Jul 28, 2015
Silicide formation due to improved SiGe faceting
TEXAS INSTRUMENTS INC14 citations92
US9029263B1May 12, 2015
Method of printing multiple structure widths using spacer double patterning
TEXAS INSTRUMENTS INC25 citations92
US10950488B2Mar 16, 2021
Integration of finFET device
TEXAS INSTRUMENTS INC2 citations72
US9543437B2Jan 10, 2017
Integrated circuit with dual stress liner boundary
TEXAS INSTRUMENTS INC2 citations72
US8987748B2Mar 24, 2015
Drain induced barrier lowering with anti-punch-through implant
TEXAS INSTRUMENTS INC6 citations71
US9202883B2Dec 1, 2015
Silicide formation due to improved SiGe faceting
TEXAS INSTRUMENTS INC1 citations62
US9412741B2Aug 9, 2016
Integration of analog transistor
TEXAS INSTRUMENTS INC2 citations61
US9202810B2Dec 1, 2015
Integration of analog transistor
TEXAS INSTRUMENTS INC2 citations61
US9171901B2Oct 27, 2015
Method for improving device performance using dual stress liner boundary
TEXAS INSTRUMENTS INC2 citations61
US9953967B2Apr 24, 2018
Integrated circuit with dual stress liner boundary
TEXAS INSTRUMENTS INC0 citations51
US9406769B2Aug 2, 2016
Silicide formation due to improved SiGe faceting
TEXAS INSTRUMENTS INC0 citations51
US9922971B2Mar 20, 2018
Integration of analog transistor
TEXAS INSTRUMENTS INC0 citations50
QUALCOMM INC
8 patentsUS9634138B1Apr 25, 2017
Field-effect transistor (FET) devices employing adjacent asymmetric active gate / dummy gate width layout
QUALCOMM INC15 citations82
US10490558B2Nov 26, 2019
Reducing or avoiding mechanical stress in static random access memory (SRAM) strap cells
QUALCOMM INC4 citations72
US10062768B2Aug 28, 2018
Field-effect transistor (FET) devices employing adjacent asymmetric active gate / dummy gate width layout
QUALCOMM INC3 citations71
US9882051B1Jan 30, 2018
Fin field effect transistors (FETs) (FinFETs) employing dielectric material layers to apply stress to channel regions
QUALCOMM INC4 citations71
US11444201B2Sep 13, 2022
Leakage current reduction in polysilicon-on-active-edge structures
QUALCOMM INC0 citations62
US10996261B2May 4, 2021
Sensor for gate leakage detection
QUALCOMM INC0 citations62
US11075206B2Jul 27, 2021
SRAM source-drain structure
QUALCOMM INC0 citations60
US10600774B2Mar 24, 2020
Systems and methods for fabrication of gated diodes with selective epitaxial growth
QUALCOMM INC0 citations51