Inventor
KUMAKURA SHO
JP31 patents
Patents
31 patentsUS11450537B2Sep 20, 2022
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD2 citations72
US10755944B2Aug 25, 2020
Etching method and plasma processing apparatus
TOKYO ELECTRON LTD2 citations72
US10600660B2Mar 24, 2020
Method of selectively etching first region made of silicon nitride against second region made of silicon oxide
TOKYO ELECTRON LTD1 citations72
US10319613B2Jun 11, 2019
Method of selectively etching first region made of silicon nitride against second region made of silicon oxide
TOKYO ELECTRON LTD3 citations72
US12451361B2Oct 21, 2025
Plasma processing method, plasma processing apparatus, and plasma processing system
TOKYO ELECTRON LTD0 citations62
US12354837B2Jul 8, 2025
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US12308241B2May 20, 2025
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US12071687B2Aug 27, 2024
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US11637025B2Apr 25, 2023
Apparatus for selectively etching first region made of silicon nitride against second region made of silicon oxide
TOKYO ELECTRON LTD0 citations62
US11574806B2Feb 7, 2023
Film forming method
TOKYO ELECTRON LTD0 citations62
US11488836B2Nov 1, 2022
Apparatus for substrate processing
TOKYO ELECTRON LTD1 citations62
US11459655B2Oct 4, 2022
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US11239090B2Feb 1, 2022
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations62
US11145518B2Oct 12, 2021
Method and apparatus for etching target object
TOKYO ELECTRON LTD0 citations62
US11114304B2Sep 7, 2021
Substrate processing method
TOKYO ELECTRON LTD0 citations62
US11961746B2Apr 16, 2024
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US11728166B2Aug 15, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US11094550B2Aug 17, 2021
Etching method and etching apparatus
TOKYO ELECTRON LTD0 citations61
US12125710B2Oct 22, 2024
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations60
US11139169B2Oct 5, 2021
Etching method and etching apparatus
TOKYO ELECTRON LTD0 citations60
US12431335B2Sep 30, 2025
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations59
US12112954B2Oct 8, 2024
Etching method, substrate processing apparatus, and substrate processing system
TOKYO ELECTRON LTD1 citations59
US12532683B2Jan 20, 2026
Apparatus for substrate processing
TOKYO ELECTRON LTD0 citations52
US10777425B2Sep 15, 2020
Method of processing substrate
TOKYO ELECTRON LTD0 citations52
US11380555B2Jul 5, 2022
Etching method and etching apparatus
TOKYO ELECTRON LTD0 citations51
US10916420B2Feb 9, 2021
Processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations51
US10672605B2Jun 2, 2020
Film forming method
TOKYO ELECTRON LTD0 citations51
US10483118B2Nov 19, 2019
Etching method
TOKYO ELECTRON LTD0 citations51
US10269578B2Apr 23, 2019
Etching method
TOKYO ELECTRON LTD0 citations51
US11862441B2Jan 2, 2024
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations49
US12100578B2Sep 24, 2024
Substrate processing method
TOKYO ELECTRON LTD0 citations47