Inventor

LU XINLIANG

US62 patents

⚠️ This page may combine multiple inventors who share the name “LU XINLIANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LU XINLIANG

APPLIED MATERIALS INC

Epitaxial deposition process and apparatus

Methods of thin film process

Methods and systems for forming at least one dielectric layer

Lid assembly for front end of line fabrication

Method for front end of line fabrication

Pulsed nucleation deposition of tungsten layers

Method for depositing tungsten-containing layers by vapor deposition techniques

Method for depositing tungsten-containing layers by vapor deposition techniques

Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer

Pulsed deposition process for tungsten nucleation

Method for depositing tungsten-containing layers by vapor deposition techniques

NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors

Method and apparatus for trench and via profile modification

Passivation layer formation by plasma clean process to reduce native oxide growth

Contact clean by remote plasma and repair of silicide surface

Contact clean by remote plasma and repair of silicide surface

Methods of lowering wordline resistance

Methods for manufacturing metal gates

Deposition of metal films using alane-based precursors

Deposition methods for uniform and conformal hybrid titanium oxide films

Deposition of N-metal films comprising aluminum alloys

Oxide etch with NH4-NF3 chemistry

Nucleation-free gap fill ALD process

Nucleation-free gap fill ALD process

MATTSON TECH INC

Surface treatment of carbon containing films using organic radicals

Surface treatment of silicon or silicon germanium surfaces using organic radicals

Chamber seasoning to improve etch uniformity by reducing chemistry

Surface treatment of silicon and carbon containing films by remote plasma with organic precursors

Surface treatment of silicon or silicon germanium surfaces using organic radicals

Integration of materials removal and surface treatment in semiconductor device fabrication

Surface pretreatment process to improve quality of oxide films produced by remote plasma

Processing of workpieces with reactive species generated using alkyl halide

Methods for processing a workpiece using fluorine radicals

Generation of hydrogen reactive species for processing of workpieces

Method for processing a workpiece

Silicon oxide selective dry etch process

Ozone treatment for selective silicon nitride etch over silicon

Chamber seasoning to improve etch uniformity by reducing chemistry

Selective deposition using methylation treatment

Air leak detection in plasma processing apparatus with separation grid

Surface treatment of carbon containing films using organic radicals

Silicon oxide selective dry etch process

Processing of workpieces using hydrogen radicals and ozone gas

Integration of materials removal and surface treatment in semiconductor device fabrication

Ozone for selective hydrophilic surface treatment

KAO CHIEN-TEH

Method for removing oxides

APPPLIED MATERIALS INC

Method for front end of line fabrication

GANGULI SESHADRI

NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors

CHANG MEI

Method and apparatus for trench and via profile modification

LU XINLIANG

Selective etching of silicon nitride