Inventor
KAMABUCHI AKIRA
JP19 patents
⚠️ This page may combine multiple inventors who share the name “KAMABUCHI AKIRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SUMITOMO CHEMICAL CO
10 patentsUS6627381B1Sep 30, 2003
Chemical amplification type positive resist composition
SUMITOMO CHEMICAL CO28 citations92
US6548220B2Apr 15, 2003
Chemical amplifying type positive resist composition and sulfonium salt
SUMITOMO CHEMICAL CO54 citations91
US6818379B2Nov 16, 2004
Sulfonium salt and use thereof
SUMITOMO CHEMICAL CO14 citations82
US5965748AOct 12, 1999
Succinimide derivative, process for production and use thereof
SUMITOMO CHEMICAL CO2 citations62
US7576223B2Aug 18, 2009
Chemical amplification type resist composition
SUMITOMO CHEMICAL CO2 citations61
US7160669B2Jan 9, 2007
Chemical amplification type resist composition
SUMITOMO CHEMICAL CO4 citations61
US6777511B2Aug 17, 2004
Process for producing poly (meth) acrylates having reduced metal content
SUMITOMO CHEMICAL CO3 citations60
US9268226B2Feb 23, 2016
Resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations51
US7396899B2Jul 8, 2008
Chemical amplification type resist composition
SUMITOMO CHEMICAL CO0 citations51
US7135268B2Nov 14, 2006
Amplification type positive resist composition
SUMITOMO CHEMICAL CO0 citations41
ICHIKAWA KOJI
5 patentsUS8592129B2Nov 26, 2013
Resin, resist composition and method for producing resist pattern
ICHIKAWA KOJI2 citations62
US9360754B2Jun 7, 2016
Resin and photoresist composition comprising the same
ICHIKAWA KOJI0 citations51
US8859182B2Oct 14, 2014
Resist composition and method for producing resist pattern
ICHIKAWA KOJI0 citations41
US8685618B2Apr 1, 2014
Resist composition and method for producing resist pattern
ICHIKAWA KOJI0 citations41
US8563217B2Oct 22, 2013
Resist composition and method for producing resist pattern
ICHIKAWA KOJI0 citations41