Inventor
KENGOYAMA YUKO
JP5 patents
Patents
5 patentsUS12033849B2Jul 9, 2024
Method for depositing silicon oxide film having improved quality by PEALD using bis(diethylamino)silane
ASM IP HOLDING BV0 citations60
US11527400B2Dec 13, 2022
Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
ASM IP HOLDING BV1 citations60
US12417911B2Sep 16, 2025
Method and system for forming silicon nitride layer using low radio frequency plasma process
ASM IP HOLDING BV0 citations48
US10707073B2Jul 7, 2020
Film forming method and patterning method
ASM IP HOLDING BV0 citations48
US10770257B2Sep 8, 2020
Substrate processing method
ASM IP HOLDING BV0 citations38