Inventor · disambiguated record
Masaaki Miyajima
Also filed as: MIYAJIMA MASAAKI
9 granted patents·1 pending application·106 citations·filing 1989–2018
87Inventor score
Top patents by PatentIndex Score
10 records- 0165US10418445B2Silicon carbide semiconductor device and method of manufacturing a silicon carbide semiconductor deviceFUJI ELECTRIC CO LTD·Filed 2018·Granted Sep 17, 2019·1 cites·8 claims
- 0262US5537487APattern judging method, mask producing method, and method of dividing block pattern for use in block exposureFUJITSU LTD·Filed 1994·Granted Jul 16, 1996·16 cites·18 claims
- 0360US5917579ABlock exposure of semiconductor waferFUJITSU LTD·Filed 1997·Granted Jun 29, 1999·16 cites·9 claims
- 0458US5995878AMethod and apparatus for generating exposure data of semiconductor integrated circuitFUJITSU LTD·Filed 1997·Granted Nov 30, 1999·15 cites·10 claims
- 0557US5046012APattern data processing methodFUJITSU LTD·Filed 1989·Granted Sep 3, 1991·32 cites·15 claims
- 0654US7205557B2Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation methodFUJITSU LTD·Filed 2005·Granted Apr 17, 2007·1 cites·16 claims
- 0751US6275604B1Method and apparatus for generating semiconductor exposure dataFUJITSU LTD·Filed 1998·Granted Aug 14, 2001·21 cites·31 claims
- 0844US2006076513A1Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation methodFUJITSU LTD·Filed 2005·Application pending·0 cites
- 0943US8141009B2Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic processMIYAJIMA MASAAKI·Filed 2009·Granted Mar 20, 2012·0 cites·9 claims
- 1038US5984505ABlock exposure of semiconductor waferFUJITSU LTD·Filed 1997·Granted Nov 16, 1999·4 cites·15 claims
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