Inventor

HOCHBERG ARTHUR KENNETH

US19 patents

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HOCHBERG ARTHUR KENNETH

AIR PROD & CHEM

Process for metal metalloid oxides and nitrides with compositional gradients

Precursors for depositing silicon containing films and processes thereof

Deposition of silicon dioxide and silicon oxynitride using bis(tertiarybutylamino) silane

Low temperature deposition of silicon dioxide using organosilanes

Silicon nitride from bis(tertiarybutylamino)silane

Precursors for CVD silicon carbo-nitride films

Precursors for CVD silicon carbo-nitride and silicon nitride films

Synthesis of metal oxide and oxynitride

Liquid precursor mixtures for deposition of multicomponent metal containing materials

Synthesis of tantalum nitride

Method and vessel for the delivery of precursor materials

Precursors for CVD silicon carbo-nitride films

Precursors for depositing silicon containing films

Deposition and annealing of multicomponent ZrSnTi and HfSnTi oxide thin films using solventless liquid mixture of precursors

Process of CVD of Hf and Zr containing oxynitride films

Single source mixtures of metal siloxides

Precursors for CVD silicon carbo-nitride films

Diethylsilane as a silicon source in the deposition of metal silicate films

XIAO MANCHAO

Methods for depositing silicon carbo-nitride film