Inventor
OH SEUNG HWA
KR2 patents
Patents
2 patentsUS9846359B1Dec 19, 2017
Diffraction-based overlay marks and methods of overlay measurement
SAMSUNG ELECTRONICS CO LTD12 citations80
US9281250B2Mar 8, 2016
Method of detecting an asymmetric portion of an overlay mark and method of measuring an overlay including the same
SAMSUNG ELECTRONICS CO LTD0 citations48