Inventor
ABE TAKAYUKI
JP132 patents
⚠️ This page may combine multiple inventors who share the name “ABE TAKAYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NUFLARE TECHNOLOGY INC
14 patentsUS7740991B2Jun 22, 2010
Beam dose computing method and writing method and record carrier body and writing apparatus for determining an optimal dose of a charged particle beam
NUFLARE TECHNOLOGY INC19 citations92
US7601968B2Oct 13, 2009
Charged particle beam writing method and apparatus
NUFLARE TECHNOLOGY INC19 citations92
US9177372B2Nov 3, 2015
Defect estimation device and method and inspection system and method
NUFLARE TECHNOLOGY INC5 citations84
US8781212B2Jul 15, 2014
Defect estimation device and method and inspection system and method
NUFLARE TECHNOLOGY INC6 citations84
US7973918B2Jul 5, 2011
Apparatus and method for pattern inspection
NUFLARE TECHNOLOGY INC10 citations84
US7863586B2Jan 4, 2011
Writing data creation method and charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC10 citations84
US7662522B2Feb 16, 2010
Method for manufacturing semiconductor devices, and method for forming a pattern onto an exposure mask
NUFLARE TECHNOLOGY INC11 citations84
US8352889B2Jan 8, 2013
Beam dose computing method and writing method and record carrier body and writing apparatus
NUFLARE TECHNOLOGY INC5 citations83
US7669174B2Feb 23, 2010
Pattern generation method and charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC10 citations83
US7608845B2Oct 27, 2009
Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effect
NUFLARE TECHNOLOGY INC11 citations83
US7525110B2Apr 28, 2009
Multiple irradiation effect-corrected dose determination technique for charged particle beam lithography
NUFLARE TECHNOLOGY INC14 citations83
US7511290B2Mar 31, 2009
Charged particle beam writing method and apparatus
NUFLARE TECHNOLOGY INC16 citations83
US7872745B2Jan 18, 2011
Pattern inspection apparatus and pattern inspection method
NUFLARE TECHNOLOGY INC9 citations82
US7619230B2Nov 17, 2009
Charged particle beam writing method and apparatus and readable storage medium
NUFLARE TECHNOLOGY INC10 citations82
TOSHIBA KK
10 patentsUS6333138B1Dec 25, 2001
Exposure method utilizing partial exposure stitch area
TOSHIBA KK76 citations96
US6047116AApr 4, 2000
Method for generating exposure data for lithographic apparatus
TOSHIBA KK62 citations96
US5863682AJan 26, 1999
Charged particle beam writing method for determining optimal exposure dose prior to pattern drawing
TOSHIBA KK107 citations96
US6313476B1Nov 6, 2001
Charged beam lithography system
TOSHIBA KK56 citations95
US5451487ASep 19, 1995
Electron beam lithographic method and apparatus
TOSHIBA KK27 citations93
US5008553AApr 16, 1991
Electron beam lithography method and apparatus
TOSHIBA KK44 citations93
US6172364B1Jan 9, 2001
Charged particle beam irradiation apparatus
TOSHIBA KK31 citations92
US7346882B2Mar 18, 2008
Pattern forming method, mask manufacturing method, and LSI manufacturing method
TOSHIBA KK10 citations84
US6774380B2Aug 10, 2004
Variably shaped beam EB writing system
TOSHIBA KK11 citations74
US5305225AApr 19, 1994
Charged particle litography method and apparatus
TOSHIBA KK19 citations74
HITACHI MEDICAL CORP
6 patentsUS8040134B2Oct 18, 2011
Magnetic resonance imaging device configured to suppress signals from fat by excluding effect of non-uniformity of irradiated magnetic field
HITACHI MEDICAL CORP7 citations84
US7847549B2Dec 7, 2010
Magnetic resonance imaging apparatus
HITACHI MEDICAL CORP11 citations84
US7486076B2Feb 3, 2009
Magnetic resonance imaging apparatus and method with adjustment in positioning within imaging space to correct deviation from desired position
HITACHI MEDICAL CORP11 citations84
US7467006B2Dec 16, 2008
Magnetic resonance imaging system and contrast-enhanced angiography
HITACHI MEDICAL CORP11 citations84
US7167740B2Jan 23, 2007
Measuring method in magnetic resonance imaging device and magnetic resonance imaging device
HITACHI MEDICAL CORP8 citations74
US6611144B2Aug 26, 2003
Magnetic resonance imaging device
HITACHI MEDICAL CORP11 citations74
SEMICONDUCTOR ENERGY LAB
4 patentsUS9705003B2Jul 11, 2017
Semiconductor device including first and second gate electrodes and stack of insulating layers
SEMICONDUCTOR ENERGY LAB24 citations94
US10804487B2Oct 13, 2020
Light-emitting device
SEMICONDUCTOR ENERGY LAB6 citations84
US9960213B2May 1, 2018
Input and output device having touch sensor element as input device and display device
SEMICONDUCTOR ENERGY LAB8 citations84
US9899626B2Feb 20, 2018
Light-emitting device
SEMICONDUCTOR ENERGY LAB6 citations84
YOSHINO KOGYOSHO CO LTD
3 patentsOMRON TATEISI ELECTRONICS CO
2 patentsYASHIMA JUN
2 patentsUS8122390B2Feb 21, 2012
Charged particle beam writing apparatus, and apparatus and method for correcting dimension error of pattern
YASHIMA JUN10 citations84
US8065635B2Nov 22, 2011
Method for resizing pattern to be written by lithography technique, and charged particle beam writing method
YASHIMA JUN10 citations84
YAMAZAKI SHUNPEI
1 patentTSUCHIYA HIDEO
1 patentHONDA MOTOR CO LTD
1 patentKATO YASUO
1 patentINABA SHINICHI
1 patentEMI KEIKO
1 patentOLYMPUS OPTICAL CO
1 patentPANASONIC CORP
1 patentTOYOTA MOTOR CO LTD
1 patentShowing the top 50 of 132 patents by PatentIndex Score.