Inventor · disambiguated record
Yasushi Kuroiwa
Also filed as: KUROIWA YASUSHI
9 granted patents·4 pending applications·7 citations·filing 2011–2023
77Inventor score
Top patents by PatentIndex Score
13 records- 0172US11022880B2Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compoundTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Jun 1, 2021·1 cites·14 claims
- 0272US9091916B2Positive-type photoresist composition, photoresist laminate, method for producing photoresist pattern, and method for producing connecting terminalTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Jul 28, 2015·2 cites·8 claims
- 0362US8760112B2Battery management apparatusKUROIWA YASUSHI·Filed 2011·Granted Jun 24, 2014·4 cites·14 claims
- 0454US11803122B2Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compoundTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Oct 31, 2023·0 cites·8 claims
- 0553US11402755B2Chemically amplified positive-type photosensitive resin composition, method for manufacturing substrate with template, and method for manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Aug 2, 2022·0 cites·7 claims
- 0652US2025172872A1Chemically amplified positive-type photosensitive composition, method of manufacturing substrate with template, and method of manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 0752US2025189895A1Method of manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 0850US11474432B2Chemically amplified photosensitive composition, photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Oct 18, 2022·0 cites·13 claims
- 0945US10599036B2Chemically amplified positive-type photosensitive resin compositionTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Mar 24, 2020·0 cites·9 claims
- 1042US2020142307A1Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated articleTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 1139US11061326B2Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compoundTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Jul 13, 2021·0 cites·12 claims
- 1238US2021055655A1Method for manufacturing plated molded articleTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 1333US9977328B2Chemically amplified positive-type photosensitive resin composition for thick filmTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted May 22, 2018·0 cites·10 claims
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