Inventor

YANG NENG-JYE

TW39 patents

⚠️ This page may combine multiple inventors who share the name “YANG NENG-JYE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YANG NENG-JYE

TAIWAN SEMICONDUCTOR MFG CO LTD

Surface modification layer for conductive feature formation

Semiconductor device and method

Interconnect structure for semiconductor devices

Wet etch chemistry for selective silicon etch

Surface modification layer for conductive feature formation

Semiconductor device and method of manufacture

Method for integrated circuit patterning

Semiconductor device and method of manufacture

Diffusion barrier layer for conductive via to decrease contact resistance

Self-aligned scheme for semiconductor device and method of forming the same

Wet etch chemistry for selective silicon etch

Surface modification layer for conductive feature formation

Semiconductor device and method of manufacture

Surface modification layer for conductive feature formation

Semiconductor device and method of manufacture

Chemical composition for tri-layer removal

Semiconductor device and method of manufacture

Semiconductor device and method of manufacture

Semiconductor device and method of manufacture

Selective removal of carbon-containing and nitrogen-containing silicon residues

Self-aligned scheme for semiconductor device and method of forming the same

Diffusion barrier layer for conductive via to decrease contact resistance

Self-aligned scheme for semiconductor device and method of forming the same

Diffusion barrier layer for conductive via to decrease contact resistance

Air curtain device and workpiece processing tool

Method and structure of middle layer removal

Method and structure of middle layer removal

Semiconductor devices and methods of manufacturing

Semiconductor devices and methods of manufacturing

Semiconductor devices and methods of manufacturing

Semiconductor structure and method for forming the same

Semiconductor device and method

Chemical composition for tri-layer removal

Semiconductor device and method of manufacture

Interconnect structure for semiconductor devices

Interconnect structure for semiconductor devices

Method and structure of middle layer removal

Interconnect structure for semiconductor device and related methods

TAIWAN SEMICONDUCTOR MFG

Method for integrated circuit patterning