Inventor
HARUKI TAMAE
JP11 patents
Patents
11 patentsUS5364716ANov 15, 1994
Pattern exposing method using phase shift and mask used therefor
FUJITSU LTD116 citations97
US5465220ANov 7, 1995
Optical exposure method
FUJITSU LTD55 citations96
US6099582AAug 8, 2000
Automatic revision of semiconductor device layout for solving contradiction
FUJITSU LTD22 citations92
US6045976AApr 4, 2000
Optical exposure method
FUJITSU LTD29 citations92
US5607821AMar 4, 1997
Optical exposure method
FUJITSU LTD18 citations92
US5472813ADec 5, 1995
Pattern exposing method using phase shift and mask used therefor
FUJITSU LTD24 citations92
US5415952AMay 16, 1995
Fine pattern lithography with positive use of interference
FUJITSU LTD22 citations92
US6420094B1Jul 16, 2002
Optical exposure method
FUJITSU LTD13 citations82
US5637424AJun 10, 1997
Fine pattern lithography with positive use of interference
FUJITSU LTD16 citations82
US5867401AFeb 2, 1999
Phase shifter arranging method and computer readable medium storing program for carrying out the method
FUJITSU LTD13 citations73
US5698859ADec 16, 1997
Method and device for proximity-effect correction
FUJITSU LTD17 citations73