P

Inventor

KIZUKI HIROTAKA

JP21 patents

Patents

21 patents
US5796127AAug 18, 1998

High electron mobility transistor

MITSUBISHI ELECTRIC CORP224 citations99
US5782979AJul 21, 1998

Substrate holder for MOCVD

MITSUBISHI ELECTRIC CORP584 citations98
US7307490B2Dec 11, 2007

High frequency switch device

MITSUBISHI ELECTRIC CORP68 citations97
US5459747AOct 17, 1995

Semiconductor optical devices

MITSUBISHI ELECTRIC CORP53 citations96
US6358316B1Mar 19, 2002

Method for producing semiconductor device, method for producing semiconductor laser device, and method for producing quantum wire structure

MITSUBISHI ELECTRIC CORP45 citations92
US5991322ANov 23, 1999

Semiconductor optical device

MITSUBISHI ELECTRIC CORP37 citations92
US5948161ASep 7, 1999

Method of fabricating a semiconductor device and method of cleaning a crystalline semiconductor surface

MITSUBISHI ELECTRIC CORP51 citations92
US5882952AMar 16, 1999

Semiconductor device including quantum wells or quantum wires and method of making semiconductor device

MITSUBISHI ELECTRIC CORP21 citations92
US5835516ANov 10, 1998

Semiconductor laser device and method of fabricating semiconductor laser device

MITSUBISHI ELECTRIC CORP24 citations92
US5714006AFeb 3, 1998

Method of growing compound semiconductor layer

MITSUBISHI ELECTRIC CORP36 citations92
US5608749AMar 4, 1997

Semiconductor laser diode and semiconductor laser diode array including plated heat sink (PHS) electrode

MITSUBISHI ELECTRIC CORP34 citations92
US5539763AJul 23, 1996

Semiconductor lasers and methods for fabricating semiconductor lasers

MITSUBISHI ELECTRIC CORP40 citations92
US5426658AJun 20, 1995

Semiconductor laser including ridge confining buffer layer

MITSUBISHI ELECTRIC CORP27 citations92
US5316967AMay 31, 1994

Method for producing semiconductor device

MITSUBISHI ELECTRIC CORP24 citations92
US5602414AFeb 11, 1997

Infrared detector having active regions and isolating regions formed of CdHgTe

MITSUBISHI ELECTRIC CORP26 citations90
US6096617AAug 1, 2000

Method of manufacturing a carbon-doped compound semiconductor layer

MITSUBISHI ELECTRIC CORP16 citations84
US5805628ASep 8, 1998

Semiconductor laser

MITSUBISHI ELECTRIC CORP8 citations74
US5679962AOct 21, 1997

Semiconductor device and a single electron device

MITSUBISHI ELECTRIC CORP12 citations74
US6506618B1Jan 14, 2003

Method of forming a GaInNAs layer

MITSUBISHI ELECTRIC CORP7 citations73
US5541950AJul 30, 1996

Semiconductor laser including groove having variable dimensions

MITSUBISHI ELECTRIC CORP17 citations73
US5389798AFeb 14, 1995

High-speed semiconductor device with graded collector barrier

MITSUBISHI ELECTRIC CORP14 citations73