Inventor
GARCIA GRANDA MIGUEL
NL6 patents
Patents
6 patentsUS10571812B2Feb 25, 2020
Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV2 citations66
US11385554B2Jul 12, 2022
Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrate
ASML NETHERLANDS BV0 citations58
US9518936B2Dec 13, 2016
Method and apparatus for determining lithographic quality of a structure
ASML NETHERLANDS BV2 citations58
US10871716B2Dec 22, 2020
Metrology robustness based on through-wavelength similarity
ASML NETHERLANDS BV0 citations49
US10394132B2Aug 27, 2019
Metrology robustness based on through-wavelength similarity
ASML NETHERLANDS BV0 citations49
US10895811B2Jan 19, 2021
Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method
ASML NETHERLANDS BV0 citations45