Inventor
BOS HILKO DIRK
NL6 patents
Patents
6 patentsUS12276921B2Apr 15, 2025
Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method
ASML NETHERLANDS BV2 citations71
US10795269B2Oct 6, 2020
Method of determining a value of a parameter of interest, method of cleaning a signal containing information about a parameter of interest, device manufacturing method
ASML NETHERLANDS BV3 citations70
US9786044B2Oct 10, 2017
Method of measuring asymmetry, inspection apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV4 citations68
US11181828B2Nov 23, 2021
Method of determining a value of a parameter of interest of a patterning process, device manufacturing method
ASML NETHERLANDS BV2 citations67
US12105432B2Oct 1, 2024
Metrology method and associated computer product
ASML NETHERLANDS BV2 citations65
US11099489B2Aug 24, 2021
Method of measuring a parameter of a lithographic process, metrology apparatus
ASML NETHERLANDS BV0 citations61