Inventor
DURHAM DANA
US12 patents
⚠️ This page may combine multiple inventors who share the name “DURHAM DANA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOECHST CELANESE CORP
10 patentsUS4983490AJan 8, 1991
Photoresist treating composition consisting of a mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
HOECHST CELANESE CORP30 citations92
US5019488AMay 28, 1991
Method of producing an image reversal negative photoresist having a photo-labile blocked imide
HOECHST CELANESE CORP34 citations91
US4931381AJun 5, 1990
Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
HOECHST CELANESE CORP27 citations91
US5399456AMar 21, 1995
Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound
HOECHST CELANESE CORP19 citations81
US5039594AAug 13, 1991
Positive photoresist containing a mixture of propylene glycol alkyl ethers and propylene glycol alkyl ether acetate
HOECHST CELANESE CORP11 citations73
US4948697AAug 14, 1990
Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
HOECHST CELANESE CORP14 citations73
US4806458AFeb 21, 1989
Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate
HOECHST CELANESE CORP8 citations73
US4929536AMay 29, 1990
Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
HOECHST CELANESE CORP13 citations72
US5256522AOct 26, 1993
Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
HOECHST CELANESE CORP7 citations61
US5217840AJun 8, 1993
Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
HOECHST CELANESE CORP5 citations61
HOECHST CO AMERICAN
2 patentsUS4588670AMay 13, 1986
Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist
HOECHST CO AMERICAN25 citations80
US4692398ASep 8, 1987
Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate
HOECHST CO AMERICAN18 citations73