Inventor
JAIN SANGYA
US10 patents
⚠️ This page may combine multiple inventors who share the name “JAIN SANGYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HOECHST CELANESE CORP
8 patentsUS5019488AMay 28, 1991
Method of producing an image reversal negative photoresist having a photo-labile blocked imide
HOECHST CELANESE CORP34 citations91
US4931381AJun 5, 1990
Image reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment
HOECHST CELANESE CORP27 citations91
US5399456AMar 21, 1995
Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound
HOECHST CELANESE CORP19 citations81
US4929536AMay 29, 1990
Image reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
HOECHST CELANESE CORP13 citations72
US4835086AMay 30, 1989
Polysulfone barrier layer for bi-level photoresists
HOECHST CELANESE CORP18 citations72
US5240807AAug 31, 1993
Photoresist article having a portable, conformable, built-on mask
HOECHST CELANESE CORP8 citations70
US5256522AOct 26, 1993
Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
HOECHST CELANESE CORP7 citations61
US5217840AJun 8, 1993
Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom
HOECHST CELANESE CORP5 citations61