Inventor
TSUJIMOTO HIROSHI
JP27 patents
⚠️ This page may combine multiple inventors who share the name “TSUJIMOTO HIROSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
21 patentsUS8383000B2Feb 26, 2013
Substrate processing apparatus, method for measuring distance between electrodes, and storage medium storing program
TOKYO ELECTRON LTD7 citations83
US11557498B2Jan 17, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations62
US10480978B2Nov 19, 2019
Method for inspecting flow rate controller and method for processing workpiece
TOKYO ELECTRON LTD1 citations60
US10410840B2Sep 10, 2019
Gas supplying method and semiconductor manufacturing apparatus
TOKYO ELECTRON LTD1 citations60
US12387914B2Aug 12, 2025
Upper electrode assembly
TOKYO ELECTRON LTD0 citations57
US11676800B2Jun 13, 2023
Substrate processing apparatus and control method of substrate processing apparatus
TOKYO ELECTRON LTD0 citations54
US10269539B2Apr 23, 2019
Plasma processing method
TOKYO ELECTRON LTD0 citations51
US9960016B2May 1, 2018
Plasma processing method
TOKYO ELECTRON LTD1 citations51
US7569478B2Aug 4, 2009
Method and apparatus for manufacturing semiconductor device, control program and computer storage medium
TOKYO ELECTRON LTD1 citations51
US9583315B2Feb 28, 2017
Plasma etching apparatus and plasma etching method
TOKYO ELECTRON LTD1 citations50
US9524847B2Dec 20, 2016
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations50
US10861675B2Dec 8, 2020
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations49
US10204763B2Feb 12, 2019
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations49
US9818582B2Nov 14, 2017
Plasma processing method
TOKYO ELECTRON LTD1 citations48
US12354841B2Jul 8, 2025
Substrate processing device, substrate processing system, control method for substrate processing device, and control method for substrate processing system
TOKYO ELECTRON LTD0 citations47
US9728418B2Aug 8, 2017
Etching method and etching apparatus
TOKYO ELECTRON LTD0 citations45
US12217942B2Feb 4, 2025
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations43
US10867778B2Dec 15, 2020
Cleaning method and processing apparatus
TOKYO ELECTRON LTD0 citations39
US9947510B2Apr 17, 2018
Method for supplying gas, and plasma processing apparatus
TOKYO ELECTRON LTD0 citations39
US9904299B2Feb 27, 2018
Gas supply control method
TOKYO ELECTRON LTD0 citations39
US10163607B2Dec 25, 2018
Temperature control method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations38
TSUJIMOTO HIROSHI
3 patentsUS8277673B2Oct 2, 2012
Plasma processing method and apparatus
TSUJIMOTO HIROSHI10 citations82
US8328981B2Dec 11, 2012
Method for heating a focus ring in a plasma apparatus by high frequency power while no plasma being generated
TSUJIMOTO HIROSHI4 citations60
US8070972B2Dec 6, 2011
Etching method and etching apparatus
TSUJIMOTO HIROSHI3 citations60