Inventor
CHAN MARIA C
US11 patents
⚠️ This page may combine multiple inventors who share the name “CHAN MARIA C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
10 patentsUS6030868AFeb 29, 2000
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation
ADVANCED MICRO DEVICES INC16 citations84
US6455888B1Sep 24, 2002
Memory cell structure for elimination of oxynitride (ONO) etch residue and polysilicon stringers
ADVANCED MICRO DEVICES INC10 citations73
US6232002B1May 15, 2001
Bilayer anti-reflective coating and etch hard mask
ADVANCED MICRO DEVICES INC7 citations73
US6610580B1Aug 26, 2003
Flash memory array and a method and system of fabrication thereof
ADVANCED MICRO DEVICES INC11 citations71
US6448594B1Sep 10, 2002
Method and system for processing a semiconductor device
ADVANCED MICRO DEVICES INC3 citations62
US6352930B1Mar 5, 2002
Bilayer anti-reflective coating and etch hard mask
ADVANCED MICRO DEVICES INC5 citations62
US6306706B1Oct 23, 2001
Method and system for fabricating a flash memory array
ADVANCED MICRO DEVICES INC4 citations62
US6110833AAug 29, 2000
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation
ADVANCED MICRO DEVICES INC4 citations62
US6043120AMar 28, 2000
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation
ADVANCED MICRO DEVICES INC6 citations62
US6603211B2Aug 5, 2003
Method and system for providing a robust alignment mark at thin oxide layers
ADVANCED MICRO DEVICES INC0 citations51