Inventor
HARTNER WALTER
DE66 patents
⚠️ This page may combine multiple inventors who share the name “HARTNER WALTER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AG
39 patentsUS8952521B2Feb 10, 2015
Semiconductor packages with integrated antenna and method of forming thereof
INFINEON TECHNOLOGIES AG90 citations97
US9583811B2Feb 28, 2017
Transition between a plastic waveguide and a semiconductor chip, where the semiconductor chip is embedded and encapsulated within a mold compound
INFINEON TECHNOLOGIES AG41 citations94
US6323513B1Nov 27, 2001
Semiconductor component having at least one capacitor and methods for fabricating it
INFINEON TECHNOLOGIES AG18 citations93
US7468307B2Dec 23, 2008
Semiconductor structure and method
INFINEON TECHNOLOGIES AG28 citations92
US6438019B2Aug 20, 2002
Ferroelectric random access memory (FeRAM) having storage capacitors with different coercive voltages
INFINEON TECHNOLOGIES AG29 citations92
US9910145B2Mar 6, 2018
Wireless communication system, a radar system and a method for determining a position information of an object
INFINEON TECHNOLOGIES AG7 citations84
US7982284B2Jul 19, 2011
Semiconductor component including an isolation structure and a contact to the substrate
INFINEON TECHNOLOGIES AG10 citations84
US6586348B2Jul 1, 2003
Method for preventing etching-induced damage to a metal oxide film by patterning the film after a nucleation anneal but while still amorphous and then thermally annealing to crystallize
INFINEON TECHNOLOGIES AG18 citations84
US6559003B2May 6, 2003
Method of producing a ferroelectric semiconductor memory
INFINEON TECHNOLOGIES AG16 citations83
US6649468B2Nov 18, 2003
Method for fabricating a microelectronic component
INFINEON TECHNOLOGIES AG8 citations74
US6627496B1Sep 30, 2003
Process for producing structured layers, process for producing components of an integrated circuit, and process for producing a memory configuration
INFINEON TECHNOLOGIES AG11 citations74
US6197633B1Mar 6, 2001
Method for the production of an integrated semiconductor memory configuration
INFINEON TECHNOLOGIES AG10 citations74
US6168988B1Jan 2, 2001
Method for producing barrier-free semiconductor memory configurations
INFINEON TECHNOLOGIES AG7 citations74
US6136659AOct 24, 2000
Production process for a capacitor electrode formed of a platinum metal
INFINEON TECHNOLOGIES AG12 citations74
US11824019B2Nov 21, 2023
Chip package with substrate integrated waveguide and waveguide interface
INFINEON TECHNOLOGIES AG4 citations73
US10008470B2Jun 26, 2018
Embedded chip packages and methods for manufacturing an embedded chip package
INFINEON TECHNOLOGIES AG3 citations73
US9721920B2Aug 1, 2017
Embedded chip packages and methods for manufacturing an embedded chip package
INFINEON TECHNOLOGIES AG2 citations73
US6858492B2Feb 22, 2005
Method for fabricating a semiconductor memory device
INFINEON TECHNOLOGIES AG8 citations73
US6773986B2Aug 10, 2004
Method for fabricating a semiconductor memory device
INFINEON TECHNOLOGIES AG10 citations73
US6649424B2Nov 18, 2003
Method for fabricating an integrated semiconductor circuit having a strongly polarizable dielectric or ferroelectric
INFINEON TECHNOLOGIES AG10 citations71
US6790676B2Sep 14, 2004
Method for producing a ferroelectric layer
INFINEON TECHNOLOGIES AG7 citations69
US12094842B2Sep 17, 2024
Semiconductor device having an antenna arranged over an active main surface of a semiconductor die
INFINEON TECHNOLOGIES AG0 citations63
US6730562B2May 4, 2004
Method of patterning ferroelectric layers
INFINEON TECHNOLOGIES AG4 citations63
US6316802B1Nov 13, 2001
Easy to manufacture integrated semiconductor memory configuration with platinum electrodes
INFINEON TECHNOLOGIES AG5 citations63
US12040543B2Jul 16, 2024
Radio-frequency devices and methods for producing radio-frequency devices
INFINEON TECHNOLOGIES AG1 citations62
US11879966B2Jan 23, 2024
Transmission of wireless signal having information on a local oscillator signal
INFINEON TECHNOLOGIES AG0 citations62
US11791529B2Oct 17, 2023
Radio-frequency devices and associated production methods
INFINEON TECHNOLOGIES AG1 citations62
US11764453B2Sep 19, 2023
RF devices including an RF chip having an electrical redistribution layer with RF antennas formed therein and methods of manufacture
INFINEON TECHNOLOGIES AG0 citations62
US9337159B2May 10, 2016
Semiconductor package with integrated microwave component
INFINEON TECHNOLOGIES AG1 citations62
US7276300B2Oct 2, 2007
Microelectronic structure having a hydrogen barrier layer
INFINEON TECHNOLOGIES AG2 citations62
US6852240B2Feb 8, 2005
Method of manufacturing a ferroelectric capacitor configuration
INFINEON TECHNOLOGIES AG3 citations62
US6809019B2Oct 26, 2004
Method for producing a semiconductor structure, and use of the method
INFINEON TECHNOLOGIES AG4 citations62
US6495415B2Dec 17, 2002
Method for fabricating a patterned layer
INFINEON TECHNOLOGIES AG3 citations62
US6455328B2Sep 24, 2002
Method of manufacture of a capacitor with a dielectric on the basis of strontium-bismuth-tantalum
INFINEON TECHNOLOGIES AG2 citations62
US6346424B1Feb 12, 2002
Process for producing high-epsilon dielectric layer or ferroelectric layer
INFINEON TECHNOLOGIES AG6 citations62
US11387533B2Jul 12, 2022
Semiconductor package with plastic waveguide
INFINEON TECHNOLOGIES AG0 citations59
US11251146B2Feb 15, 2022
Semiconductor devices having a non-galvanic connection
INFINEON TECHNOLOGIES AG0 citations57
US12438107B2Oct 7, 2025
High frequency devices including attenuating dielectric materials
INFINEON TECHNOLOGIES AG0 citations52
US9922946B2Mar 20, 2018
Method of manufacturing a semiconductor package having a semiconductor chip and a microwave component
INFINEON TECHNOLOGIES AG0 citations52
SIEMENS AG
3 patentsUS6043529AMar 28, 2000
Semiconductor configuration with a protected barrier for a stacked cell
SIEMENS AG72 citations96
US6051485AApr 18, 2000
Method of producing a platinum-metal pattern or structure by a lift-off process
SIEMENS AG13 citations73
US6097050AAug 1, 2000
Memory configuration with self-aligning non-integrated capacitor configuration
SIEMENS AG6 citations63
SYMETRIX CORP
3 patentsUS5962069AOct 5, 1999
Process for fabricating layered superlattice materials and AB03 type metal oxides without exposure to oxygen at high temperatures
SYMETRIX CORP52 citations95
US6322849B2Nov 27, 2001
Recovery of electronic properties in hydrogen-damaged ferroelectrics by low-temperature annealing in an inert gas
SYMETRIX CORP33 citations93
US6171934B1Jan 9, 2001
Recovery of electronic properties in process-damaged ferroelectrics by voltage-cycling
SYMETRIX CORP39 citations93
MEISER ANDREAS
2 patentsGEITNER OTTMAR
1 patentINFINCON TECHNOLOGIES AG
1 patentHIRTREITER JOSEF
1 patentShowing the top 50 of 66 patents by PatentIndex Score.